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Electrical Resistivity of Multilayers During Ion Beam Mixing

Published online by Cambridge University Press:  25 February 2011

J. Grilhe ,
J.P. Riviere ,
J. Delafond ,
C. Jaouen  and
C. Templier
J. Grilhe
Affiliation:
Laboratoire de Métallurgie Physique L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
J.P. Riviere
Affiliation:
Laboratoire de Métallurgie Physique L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
J. Delafond
Affiliation:
Laboratoire de Métallurgie Physique L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
C. Jaouen
Affiliation:
Laboratoire de Métallurgie Physique L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
C. Templier
Affiliation:
Laboratoire de Métallurgie Physique L.A. 131 du C.N.R.S. 40, avenue du Recteur Pineau 86022 Poitiers, (France)
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Abstract

A new approach is developed, employing “in situ” electrical resistivity measurements, as a tool to study ion beam mixing of evaporated metal-metal multi or bilayers. The electrical resistivity variations measured continuously during the ion bombardment exhibit a monotonical increase and a tendency toward a saturation process allowing to detect precisely the total mixing of the film. The volume fraction of intermixed atoms can be determined within the framework of a simple conduction model. Experimental results are given in the case of Fe-Al and Al-Ag multilayers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 67
Copyright
Copyright © Materials Research Society 1984

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References

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