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Electrical Properties of Novel Anodic Films Formed in Nonaqueous Electrolyte Solutions

Published online by Cambridge University Press:  10 February 2011

F. Mizutani ,
S. Takeuchi ,
T. Nishiwaki ,
N. Sato  and
M. Ue
F. Mizutani
Affiliation:
Tsukuba Research Center, Mitsubishi Chemical Corporation, 8–3–1, Chuo, Ami, Inashiki, Ibaraki 300–0397, JAPAN.
S. Takeuchi
Affiliation:
Tsukuba Research Center, Mitsubishi Chemical Corporation, 8–3–1, Chuo, Ami, Inashiki, Ibaraki 300–0397, JAPAN.
T. Nishiwaki
Affiliation:
Tsukuba Research Center, Mitsubishi Chemical Corporation, 8–3–1, Chuo, Ami, Inashiki, Ibaraki 300–0397, JAPAN.
N. Sato
Affiliation:
Tsukuba Research Center, Mitsubishi Chemical Corporation, 8–3–1, Chuo, Ami, Inashiki, Ibaraki 300–0397, JAPAN.
M. Ue
Affiliation:
Tsukuba Research Center, Mitsubishi Chemical Corporation, 8–3–1, Chuo, Ami, Inashiki, Ibaraki 300–0397, JAPAN.
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Abstract

An aluminum alloy (Al - 1.0% Si - 0.5% Cu) was anodized in nonaqueous electrolyte solutions containing propylene carbonate (PC), ethylene glycol (EG), or γ-butyrolactone (GBL) as a solvent. MIM (metal-insulator-metal) elements using these anodic films were made to evaluate their electrical properties. Leakage current of the anodic films formed in the nonaqueous solutions was lower than those formed in aqueous electrolyte solutions. These novel films are useful as a high insulating film used for a gate insulator in thin film transistor liquid crystal displays (TFT-LCD).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 500: Symposium EE – Electrically Based Microstructural Characterization II , 1997 , 113
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

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