Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Chi On Chui
Ramanathan, S.
Triplett, B.B.
McIntyre, P.C.
and
Saraswat, K.C.
2002.
Germanium MOS capacitors incorporating ultrathin high-/spl kappa/ gate dielectric.
IEEE Electron Device Letters,
Vol. 23,
Issue. 8,
p.
473.
Chui, C.O.
Kim, H.
McIntyre, P.C.
and
Saraswat, K.C.
2004.
Atomic Layer Deposition of High-<tex>$kappa$</tex>Dielectric for Germanium MOS Applications—Substrate Surface Preparation.
IEEE Electron Device Letters,
Vol. 25,
Issue. 5,
p.
274.
Chui, C.O.
Ito, F.
and
Saraswat, K.C.
2004.
Scalability and Electrical Properties of Germanium Oxynitride MOS Dielectrics.
IEEE Electron Device Letters,
Vol. 25,
Issue. 9,
p.
613.
Misra, D.
Garg, R.
Srinivasan, P.
Rahim, N.
and
Chowdhury, N.A.
2006.
Interface characterization of high-k dielectrics on Ge substrates.
Materials Science in Semiconductor Processing,
Vol. 9,
Issue. 4-5,
p.
741.
Chi On Chui
Ito, F.
and
Saraswat, K.C.
2006.
Nanoscale germanium MOS Dielectrics-part I: germanium oxynitrides.
IEEE Transactions on Electron Devices,
Vol. 53,
Issue. 7,
p.
1501.
Garg, R.
Misra, D.
and
Guha, S.
2006.
Effect of Ge Surface Nitridation on the<tex>$hboxGe/HfO_2/hboxAl$</tex>MOS Devices.
IEEE Transactions on Device and Materials Reliability,
Vol. 6,
Issue. 3,
p.
455.
Shang, H.
Gusev, E. P.
Frank, M. M.
Chu, J. O.
Bedell, S.
Gribelyuk, M.
Ott, J. A.
Wang, X.
Guarini, K. W.
and
Ieong, M.
2007.
Advanced Gate Stacks for High-Mobility Semiconductors.
Vol. 27,
Issue. ,
p.
315.
Mahata, C.
Bera, M. K.
Bose, P. K.
and
Maiti, C. K.
2007.
Nitrogen engineering in Titanium based high-k gate dielectrics on Ge.
p.
201.
On Chui, Chi
and
Saraswat, Krishna C.
2007.
Germanium-Based Technologies.
p.
295.
Grassman, Tyler J.
Bishop, Sarah R.
and
Kummel, Andrew C.
2008.
An atomic view of Fermi level pinning of Ge(100) by O2.
Surface Science,
Vol. 602,
Issue. 14,
p.
2373.
Grassman, T.J.
Bishop, S.R.
and
Kummel, A.C.
2009.
Density functional theory study of first-layer adsorption of ZrO2 and HfO2 on Ge(100).
Microelectronic Engineering,
Vol. 86,
Issue. 3,
p.
249.
Misra, D.
Ding, Y.M.
Mukhopadhyay, S.
Ganapathi, K.L.
and
Bhat, N.
2016.
Reduction of interface states in Ge/High-k gate stacks and its reliability implications.
p.
499.
Kolla, Lakshmi Ganapathi
Ding, Yiming
Misra, Durga
and
Bhat, Navakanta
2018.
Interface states reduction in atomic layer deposited TiN/ZrO2/Al2O3/Ge gate stacks.
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena,
Vol. 36,
Issue. 2,