Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-23T05:13:12.237Z Has data issue: false hasContentIssue false

Electrical and Optical Properties of CVT-grown ZnO Crystals

Published online by Cambridge University Press:  31 January 2011

Koji Abe
Affiliation:
[email protected], Nagoya Institute of Technology, Department of Electrical and Electronic Engineering, Nagoya, Japan
Masanori Oiwa
Affiliation:
[email protected], Nagoya Institute of Technology, Department of Electrical and Electronic Engineering, Nagoya, Japan
Get access

Abstract

Effects of H2O partial pressure on ZnO crystal growth by chemical vapor transport (CVT) have been investigated. The use of H2O causes the increase in growth rate of ZnO, indicating that H2O acts as a dominant oxygen source in ZnO growth by CVT. The use of H2O also improves structural, electrical, and optical properties of the CVT-grown ZnO crystals. A sharp X-ray rocking curve for the ZnO (0002) reflection was obtained, and the full width at half maximum value was 38 arcsec. Strong near band edge emission was observed in photoluminescence spectra at room temperature. Both carrier concentration and Hall mobility increased with partial pressure of H2O. The dependence of the carrier concentration on temperature indicates that there exist two donors in the CVT-grown ZnO crystals. The estimated ionization energy for the shallow donor was 35±5 meV and that for the deep donor was 115±5 meV.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Maeda, K., Sato, M., Niikura, I., and Fukuda, T., Semicond. Sci. Technol. 20, S49 (2005).10.1088/0268-1242/20/4/006Google Scholar
2 Tampo, H., Yamada, A., Fons, P., Shibata, H., Matsubara, K., Iwata, K., Niki, S., Nakahara, K., and Takasu, H., Appl. Phys. Lett. 84, 4412 (2004).10.1063/1.1758295Google Scholar
3 Ntep, J.-M., Hassani, S. Said, Lusson, A., Tromson-Carli, A., Ballutaud, D., Didier, G., Triboulet, R., J. Cryst. Growth 207, 30 (1999).10.1016/S0022-0248(99)00363-2Google Scholar
4 Mikami, M., Hong, S., Sato, T., Abe, S., Wang, J., Masumoto, K., Masa, Y., and Issiki, M., J. Cryst. Growth 304, 37 (2007).10.1016/j.jcrysgro.2007.02.031Google Scholar
5 Abe, K., Banno, Y., Sasayama, T., and Koizumi, K., Jpn. J. Appl. Phys. 48, 021101 (2009).10.1143/JJAP.48.021101Google Scholar
6 Wu, X. L., Siu, G. G., Fu, C. L., and Ong, H. C., Appl. Phys. Lett. 78, 2285 (2001).10.1063/1.1361288Google Scholar
7 Lavrov, E. V., Herklotz, F., and Weber, J., Phys. Rev. B 79, 165210 (2009).10.1103/PhysRevB.79.165210Google Scholar
8 McCluskey, M. D. and Jokela, S. J., J. Appl. Phys. 106, 071101 (2009).10.1063/1.3216464Google Scholar