Hostname: page-component-669899f699-rg895 Total loading time: 0 Render date: 2025-05-04T17:10:47.049Z Has data issue: false hasContentIssue false
  • English
  • Français

Effects of the Heat-Treatment Conditions on Microstructures of YbBa2Cu3O7-σ Superconducting Films Formed by the Dipping-Pyrolysis Process

Published online by Cambridge University Press:  10 February 2011

J. Shibata ,
K. Yamagiwa ,
I. Hirabayashi ,
T. Hirayama  and
Y. Ikuhara
J. Shibata
Affiliation:
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
K. Yamagiwa
Affiliation:
Superconductivity Research Laboratory, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
I. Hirabayashi
Affiliation:
Superconductivity Research Laboratory, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
T. Hirayama
Affiliation:
Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
Y. Ikuhara
Affiliation:
Engineering Research Institute, School of Engineering, The university of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan
Get access

Abstract

YbBa2Cu3O7-σ(Yb123) films were formed on SrTiO3(STO)(001) and LaAlO3(LAO)(001) substrates by the dipping-pyrolysis process. Using transmission electron microscopy, we investigated effects of the heat-treatment conditions in the processes of the dipping-pyrolysis method on microstructures of these films. As a result, we found that the high heating rates at the initial and final heat-treatments are necessary for achieving the epitaxial growth of the superconducting films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 623: Symposium U – Materials Science of Novel Oxide-Based Electronics , 2000 , 401
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1 Bednorz, J.B. and Muller, K.A., Z. Phys., p189, B64(1986).Google Scholar
2 Mclntyre, P.C., Cima, M.J., Smith, J.A. Jr, Hallock, R.B., Siegal, M.P. and Phillips, J.M., J.Appl.phys., p. 1868, 71 (1992).Google Scholar
3 Yamagiwa, K. and Hirabayashi, I., Physica C, p. 12, 304(1998).Google Scholar
4 Shibata, J., Yamagiwa, K., Hirabayashi, I., Ma, X.L., Yuan, J., Hirayama, T. and Ikuhara, Y., Jpn. J. Appl.Phys., p.5050, 38(1999).Google Scholar
5 Shibata, J., Yamagiwa, K., Hirabayashi, I., Hirayama, T. and Ikuhara, Y., Jpn. J. Appl. Phys., in press.Google Scholar