No CrossRef data available.
Article contents
Effects of Spacer Thickness on the Performance of InGaAs/GaAs Quantum Dot Lasers
Published online by Cambridge University Press: 17 March 2011
Abstract
It is found that the performance of self-assembled In0.5Ga0.5As/GaAs multi-stack quantum dot lasers is sensitive to the GaAs spacer thickness between the dots. Reducing the spacer thickness from 30 nm to 10 nm leads to narrow photoluminescence linewidth, low threshold current, high characteristic temperature and high internal quantum efficiency. This behavior is attributed to inhomogeneous broadening caused by dot size fluctuation related to spacer thickness.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 2001
References
REFERENCES
2.
Kirstaedter, N., Ledentsov, N. N., Grundmann, M., Bimberg, D., Ustinov, V. M., Ruvimov, S. S., Maximov, M. V., Kop'ev, P. S., and Alferov, Zh. I., Electron. Lett., 30, 1416–1417 (1994).Google Scholar
3.
Shoji, H., Nakata, Y., Mukai, K., Sugiyama, Y., Sugawara, M., Yokoyama, N., and Ishikawa, H., Electron. Lett., 32, 2023–2024 (1996).Google Scholar
4.
Liu, G. T., Stintz, A., Li, H., Malloy, K. J., and Lester, L. F., Electron. Lett., 35, 1163–1164 (1999).Google Scholar
5.
Maksimov, M. V., Gordeev, N. Yu., Zatsev, S. V., Kop'ev, P. S., Kochnev, I. V., Ledentsov, N. N., Lunev, A. V., Ruvimov, S. S., Sakharov, A. V., Tsatsul'nikov, A. F., Shernyakov, Yu. M., Alferov, Zh. I., and Bimberg, D., Semiconductors, 31, 124–126 (1997).Google Scholar
6.
Xie, Q., Madhukar, A., Chen, P., and Kobayashi, N. P., Phys. Rev. Lett., 75, 2542–2545 (1995).Google Scholar
7.
Nee, T.-E., Yeh, N.-T., Shiao, P.-W., Chyi, J.-I., and Lee, C. T., Jpn. J. Appl. Phys., 38, 650–652 (1999).Google Scholar
8.
Chyi, J.-I., Nee, T.-E., Lee, C.-T., Shieh, J.-L., and Pan, J.-W., J. Crystal Growth., 175/176, 777–780 (1997).Google Scholar
10.
Binsma, J.J.M., Thijs, P.J.A., Dongen, T. van, Sander-Jochem, M.J.H., and Slootweg, R.W.M., Sixth International Conference on Indium Phosphide and Related Materials, Netherlands, 10–13(1994).Google Scholar
11.
Williams, P.J., Robbins, D.J., Cush, R., Scott, M.D., Davies, J.I., Marshall, A.C., Riffat, J., Carter, A.C., Electron. Lett., 24, 859–860 (1998).Google Scholar