Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T17:56:24.020Z Has data issue: false hasContentIssue false
  • English
  • Français

Effects of Reactive Gas Compositions on the Magnetic Properties and Microstructures of FeTaNC Films

Published online by Cambridge University Press:  10 February 2011

Tae-Hyuk Koh ,
Dong-Hoon Shin ,
Woon Choi ,
Dong-Hoon Ahn ,
Seoung-Eui Nam  and
Hyoung-June Kim
Tae-Hyuk Koh
Affiliation:
Department of Metallurgy & Materials Science, Hong-ik University, Seoul, Korea
Dong-Hoon Shin
Affiliation:
Department of Metallurgy & Materials Science, Hong-ik University, Seoul, Korea
Woon Choi
Affiliation:
Department of Metallurgy & Materials Science, Hong-ik University, Seoul, Korea
Dong-Hoon Ahn
Affiliation:
LG Electronics, Seoul, Korea
Seoung-Eui Nam
Affiliation:
Department of Metallurgy & Materials Science, Hong-ik University, Seoul, Korea
Hyoung-June Kim
Affiliation:
Department of Metallurgy & Materials Science, Hong-ik University, Seoul, Korea
Get access

Abstract

Soft magnetic properties and microstructure evolutions of FeTaNC films were investigated, and compared with those of FeTaN and FeTaC films. Effects of substrate species (glass vs. CaTiO3) on the magnetic properties were also investigated. Co-addition of N and C enhances the grain refinements and soft magnetism compared with N or C only addition. Good soft magnetic characteristics of coercivity of 0.17 Oe, permeability of 4000 (5 MHz), and magnetic flux density of 17 kG can be obtained in the FeTaNC films with the relatively wide process ranges. While these values appear to be similar to those of FeTaN films on glass substrate, the most distinctive difference between FeTaNC and FeTaN (or C) films is the effects of substrate. Whereas FeTaNC films show good magnetic characteristics on both glass and CaTiO3 substrates, FeTaN (or C) films show substantial degradation on the CaTiO3 substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 169
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Takahashi, M. and Shimatsu, T., J. Magn. Mater. 101, 11 (1991).Google Scholar
2. Herzer, G., J. Magn. Mater. 112, 258 (1992).Google Scholar
3. Nakauishi, K., Shimizu, O. and Yoshida, S., J. Magn. Soc. Jpn. 15, 371 (1991).Google Scholar
4. Shimatus, M., Takahashi, M. and Wakiyama, T., J. Magn. Soc. Jpn. 13, 577 (1989).Google Scholar
5. Ishiwata, N., Wakabayashi, C. and Urai, H., J. Appl. Phys. 69, 616 (1991).Google Scholar
6. Shin, D.H., Ahn, D.H., Kim, H.J. and Nam, S.E., Proceeding of the 3rd ISPMM 1, 256 (1995).Google Scholar
7. Takeshima, Y., J. Appl. Phys. 73, 6576 (1993).Google Scholar
8. Takahashi, M. and Shimatsu, T., IEEE Trans. Magn. MAG–26, 1485 (1990).Google Scholar