Hostname: page-component-cd9895bd7-lnqnp Total loading time: 0 Render date: 2024-12-27T01:59:49.126Z Has data issue: false hasContentIssue false

The Effects of Mg Doping on the Materials and Dielectric Properties of Ba1-xSrxTiO3 Thin Films

Published online by Cambridge University Press:  10 February 2011

M.W. Cole
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
P.C. Joshi
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
R.L Pfeffer
Affiliation:
Physics Dept., Rurgers University, Piscataway, New Jersey 08854
C.W. Hubbard
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
E. Ngo
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
M.H. Ervin
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
M.C. Wood
Affiliation:
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
Get access

Abstract

We have investigated the dielectric, insulating, structural, microstructural, interfacial, and surface morphological properties of Ba0.60Sr0.40TiO3 thin films Mg doped from 0 to 20 mol%. A strong correlation was observed between the films structural, dielectric and insulating properties as a function of Mg doping. Non textured polycrystalline films with a dense microstructure and abrupt film--Pt electrode interface were obtained after annealing at 750°C for 30 min. Single phase solid solution films were achieved at Mg doping levels up to 5 mol%, while multiphased films were obtained for Mg doping levels of 20 mol%. Decreases in the films dielectric constant, dielectric loss, tunability and leakage current characteristics were paralleled by a reduction in grain size as a function of increasing Mg dopant concentration. Our results suggest that Mg doping serves to limit grain growth and is thereby responsible for lowering the dielectric constant from 450 to 205. It is suggested that Mg behaves as an acceptor-type and is responsible for the doped films low dielectric loss and good leakage current characteristics. Performance-property trade-offs advocates the 5 mol% Mg doped Ba0.60Sr0.40TiO3 film to be an excellent choice for tunable microwave device applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Horwitz, J. S., Pond, J. M, Tadayan, B., Auyeung, R. C. Y., Dorsey, P. C., Christy, D. B., Qudri, S. B., and Muller, C., Mat. Res. Soc. Symp. Proc. 361, 515 (1995).Google Scholar
2 Drach, W., Koscica, T., Babbitt, R. W., Sengupta, L., Ngo, E., Stowell, S., and Lancto, R., Proc. of the 9th IEEE Symp. on Ferroelectrics 79 (1994).Google Scholar
3 Sengupta, L. C, Ngo, E. and Synowczynski, J., Integrated Ferroelectrics 17, 287 (1997).Google Scholar
4 Varadan, V. K., Ghodgaonkar, D. K., Varadan, V. V., Kelly, J. F., and Glikerdas, P., Microwave J. 35, 116 (1992).Google Scholar
5 Babbit, R. W., Koscica, T. E., and Drach, W. C., Microwave J. 35, 63 (1992).Google Scholar
6 Lahiry, Sharmistha, Gupta, Vinay, and Sreenivas, K., Proceedings of the 11th IEEE International Symp. Applications of Ferroelectrics 129 (1998).Google Scholar
7 Seong, Nak-Jin and Yoon, Soon-Gil, Integrated Ferroelectrics 21, 207 (1998).Google Scholar
8 Tsu, Robert, Liu, Hung-Yu, Hsu, Wei-Yung, Summerfelt, Scott, Aoki, Katsuhiro, and Gnade, Bruce, Mat. Res Soc. Symp. Proc. 361, 275 (1995).Google Scholar
9 Tabata, H., Kawai, T., Kawai, S., Nurata, O., Fujoka, J., and Minakata, S., Appl. Phys. Lett. 59, 2354 (1991).Google Scholar
10 Hwang, C. S., Park, O. S., Kang, C. S., Cho, H.-J., Kang, H.-K., Ahn, S. T., and Lee, M. Y., Jpn. J. Appl. Phys. 1 34, 5178 (1995).Google Scholar