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Effects of Ion Dose on the Morphology and Crystallization of Amorphous Germanium

Published online by Cambridge University Press:  25 February 2011

L.M. Wang ,
R.C. Birtcherand  and
L.E. Rehn
L.M. Wang
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL 60439
R.C. Birtcherand
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL 60439
L.E. Rehn
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL 60439
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Abstract

1.5 MeV Kr+ irradiation of polycrystalline Ge at room temperature, and subsequent annealing were carried out with in situ TEM observations. After a Kr+ dose of 1.2x1014 ions/cm2, Ge in the electron transparent region was completely amorphized. Continuous irradiation of the amorphized Ge resulted in a high density of small cavities. These cavities, first observed after 7x1014 ions/cm2 with an average diameter of ∼3 nm, grew into large (∼50 nm) irregular-shaped holes, transforming the irradiated Ge into a sponge-like material after 8.5x1015 ions/cm2. The crystallization temperature and the morphology of the crystallized Ge after annealing were found to be dependent on the Kr+ dose. The sponge-like structure was retained after crystallization at ∼600°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 659
Copyright
Copyright © Materials Research Society 1990

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References

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