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Effect of RF Plasma on Silicon Nitride Deposition from SiF4/NH3 Gas Mixtures in a Hot Wall Reactor

Published online by Cambridge University Press:  21 February 2011

C. Gomez-Aleixandre ,
O. Sanchez  and
J. M. Albella
C. Gomez-Aleixandre
Affiliation:
Instituto Ciencia de Materiales, CSIC, Universidad Autónoma,C12. Cantoblanco, 28049 Madrid.Spain
O. Sanchez
Affiliation:
Instituto Ciencia de Materiales, CSIC, Universidad Autónoma,C12. Cantoblanco, 28049 Madrid.Spain
J. M. Albella
Affiliation:
Instituto Ciencia de Materiales, CSIC, Universidad Autónoma,C12. Cantoblanco, 28049 Madrid.Spain
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Abstract

Si3N4 films have been deposited on silicon substrates at high temperatures (800–1000° C) in a plasma CVD hot wall reactor using SiF4 and NH3 as primary reactant gases. In this range of temperatures the activation energy is 35.9 Kcal mol−1 grad−1. The effect of an RF plasma induced either in the up or in the down stream configuration has been evaluated. The results show that in the 200–400 w range the reaction rate increases linearly with the RF power. The addition of hydrogen to the above gas mixture also produces an enhancement of the deposition reaction, probably as a consequence of the inhibition of the etching effect of the fluorine atoms on the Si3N4 deposited layers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 190: Symposium M – Plasma Processing and Synthesis of Materials III , 1990 , 107
Copyright
Copyright © Materials Research Society 1991

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References

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