Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-25T16:39:06.156Z Has data issue: false hasContentIssue false
  • English
  • Français

The effect of reactive ion etching parameters on the electrical properties and the removal of residual organics in spin-coated colloidal ITO films

Published online by Cambridge University Press:  10 June 2013

Salil M. Joshi  and
Rosario A. Gerhardt
Salil M. Joshi
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive NW, Atlanta GA 30332.USA.
Rosario A. Gerhardt
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, 771 Ferst Drive NW, Atlanta GA 30332.USA.
Get access

Abstract

Spheroidal colloidal indium tin oxide (ITO) nanoparticles, about 6 nm in diameter, were synthesized in-house and films were fabricated from them on glass substrates by spin coating. These films had high electrical resistivity due to the presence of organic capping ligands around each nanoparticle. Although high temperature annealing has been shown to reduce film resistivity by over eight orders of magnitude, lower temperature processing is desirable for applications like flexible electronics. Colloidal ITO films were subjected to a series of alternating RIE treatments in oxygen (5 minutes duration per cycle) and in argon (1 minute duration per cycle); and parameters such as gas pressure, RIE power and number of cycles were varied. These RIE treatments were found to reduce the film resistivity significantly. Among the parameters studied, gas pressure during RIE was found to be the most important parameter that determined the effectiveness of the treatment. Residual carbon content variation characterization done by XPS depth profiles also indicated similar trends.

Keywords

transparent conductornanoscalethin film
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1574: Symposium UU – Plasma and Low-Energy Ion-Beam-Assisted Processing and Synthesis of Energy-Related Materials , 2013 , mrss13-1574-uu05-12
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Lewis, B. G. and Paine, D. C., MRS Bulletin 25(8), 22–27 (2000).CrossRefGoogle Scholar
Gordon, R. G., MRS Bulletin 25(8), 52–57 (2000).CrossRefGoogle Scholar
Shigesato, Y. and Paine, D. C., Applied Physics Letters 62(11), 1268–1270 (1993).CrossRefGoogle Scholar
Izumi, H., Ishihara, T., Yoshioka, H. and Motoyama, M., Thin Solid Films 411(1), 32–35 (2002).CrossRefGoogle Scholar
Paine, D. C., Whitson, T., Janiac, D., Beresford, R., Yang, C. O. and Lewis, B., Journal of Applied Physics 85(12), 8445–8450 (1999).CrossRefGoogle Scholar
Hong, H. S., Jung, H. and Hong, S.-J., Research on Chemical Intermediates 36(6-7), 761–766 (2010).CrossRefGoogle Scholar
Matthews, S., De Bosscher, W., Blondeel, A., Van Holsbeke, J. and Delrue, H., Vacuum 83(3), 518–521 (2008).CrossRefGoogle Scholar
Joshi, S. M. and Gerhardt, R. A., Journal of Materials Science 48(4), 1465–1473 (2012).CrossRefGoogle Scholar
Joshi, S. M., Book, G. W. and Gerhardt, R. A., Thin Solid Films 520(7), 2723–2730 (2012).CrossRefGoogle Scholar
Joshi, S. M., PhD dissertation, Georgia Institute of Technology, 2013.Google Scholar
Capozzi, C. J., Ivanov, I. N., Joshi, S. and Gerhardt, R. A., Nanotechnology 20(14), 145701 (2009).CrossRefGoogle Scholar
Frank, G. and Köstlin, H., Applied Physics A: Materials Science & Processing 27(4), 197–206 (1982).CrossRefGoogle Scholar
Gonzalez, G. B., Mason, T. O., Quintana, J. P., Warschkow, O., Ellis, D. E., Hwang, J. H., Hodges, J. P. and Jorgensen, J. D., Journal of Applied Physics 96(7), 3912–3920 (2004).CrossRefGoogle Scholar
Sheridan, T. E., Goeckner, M. J. and Goree, J., Applied Physics Letters 57(20), 2080–2082 (1990).CrossRefGoogle Scholar