Hostname: page-component-586b7cd67f-gb8f7 Total loading time: 0 Render date: 2024-11-25T15:36:30.785Z Has data issue: false hasContentIssue false

Effect of Electric Field on Metal Induced Lateral Crystallization of Amorphous Silicon

Published online by Cambridge University Press:  15 March 2011

Shivani Singla
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
M.C. Poon*
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
M. Chan
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
M. Qin
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
W.Y. Chan
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
C.Y. Yuen
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
P.K. Ko
Affiliation:
Dept. of Electrical and Electronic Engineering, Hong Kong University of Science & Technology, Sai Kung, Hong Kong
H. Wong
Affiliation:
Dept. of Electronic Engineering, City University of Hong Kong, Kowloon Tong, Hong Kong
*
corresponding author: Tel: (852)2358-7047, Fax:(852)2358-1485, e-mail:[email protected]
Get access

Abstract

The effects of electric field on the rate of metal induced lateral crystallization (MILC) of amorphous silicon were investigated. Nickel silicide, which is known to be a key species for the low temperature crystallization, was driven by an electric field. As a result, the crystallization velocity of EMILC was much faster than that of conventional MILC methods. Directional crystallization of amorphous silicon thin film was successfully achieved by applying a DC field during heat treatment. The crystallization was performed at different temperatures (500-625°) by employing a thin layer of nickel (30°). The directionality of the resulting crystallization depended on the polarity of the electric field. The lateral crystallization velocity was three to four times faster than MILC when an electric field of 53.5V/cm was applied.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Song, Kyung-Sub and Choi, Duck-Kyun, Electric Field Effect On the Metal Induced Crystallization of Amorphous Silicon, Electochemical Society Proceedings, Vol 97–23.Google Scholar
2. Park, Sang-Hyun, Jun, Seung-Ik Song, Kyung-Sub, Kim, Chang-Kyung and Choi, Duck-Kyun, Field Aidied Lateral Crystallization Of Amorphous Silicon Thin Film, Japanese Journal of Applied Physics, Vol.38 (1999) pp.L108–L109Google Scholar
3. Murakami, Hiroko, Ono, Kazunori, Takai, Hiroshi, Effects of electric field on silicide formation, Applied Surface Science 117/118 (1997)289293.Google Scholar
4. Jang, Jin, Oh, Jae Young, Kim, Sung Ki, Choi, Young Jin, Yoon, SooYoung and Kim, Chae Ok, Electric-field-enhanced crystallization of amorphous silicon Nature, vol.395. (October 1998)pp.481483.Google Scholar
5. Jun, Seung-Ik, Yang, Yong-Ho, Lee, Jae-Bok and Choi, Duck-Kyun, Electrical characteristics of thin film transistors using field aided lateral Crstallization, Applied Physics Letters, Vol.75, Number 15, page 22352237(October1999)Google Scholar