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Effect of Deposition Temperature and Post-Heat-Treatment Condition on the Characteristics of (100)-Self-Orientation LaNiO3 Films Prepared by RF Magnetron Sputter Deposition

Published online by Cambridge University Press:  01 February 2011

Kenji Takahashi ,
Muneyasu Suzuki ,
Takahiro Oikawa ,
Haydn Chen  and
Hiroshi Funakubo
Kenji Takahashi
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Muneyasu Suzuki
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Takahiro Oikawa
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN
Haydn Chen
Affiliation:
Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, HONG KONG
Hiroshi Funakubo
Affiliation:
Department of Innovative and Engineered Materials, Tokyo Institute of Technology, G1–405, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226–8502, JAPAN PRESTO, Japan Science and Technology Agency (JST), 4–1–8 Honmachi, Kawaguchi, Saitama 332–0012, JAPAN
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Abstract

La-Ni-O films were deposited at deposition temperature ranging from 250 to 540°C by rf magnetron sputter deposition. The effects of deposition temperature and the following heat-treatment condition on the constituent phases and characteristics of LaNiO3 films were investigated. LaNiO3 phase was obtained at the deposition temperature of 250 and 360°C, while La-rich phase of La2NiO4 was appeared above 540°C. Crystalline phases of resultant films after the following heat-treatment strongly depended on the partial pressure of oxygen gas in ambience, i.e., in case of the heat-treatment at 800°C, diffraction peaks originated from LaNiO3 phase disappeared on XRD patterns in pure nitrogen gas ambience, while impurity peaks of NiO appeared in oxygen-excess (>50%) ambience. As a result, LaNiO3 films with high crystallinity and the same lattice parameter as the bulk one were obtained in the deposition at 360°C followed by the heat-treatment at 700°C in air.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 833: Symposium G – Materials, Integration, and Packaging Issues for High-Frequency Devices II , 2004 , G1.9
Copyright
Copyright © Materials Research Society 2005

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References

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