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Dislocation Forest Interactions: Simulation and Prediction

Published online by Cambridge University Press:  15 February 2011

L. K. Wickham
Affiliation:
Lawrence Livermore Lab, P.O. Box 808, Livermore, CA 94551 IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
K. W. Schwarz
Affiliation:
IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
J. S. Stölken
Affiliation:
Lawrence Livermore Lab, P.O. Box 808, Livermore, CA 94551
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Abstract

Using linear elastic dislocation dynamics simulations, we show that junction formation between dislocations from various interacting slip systems can be predicted by a simple self-energy calculation. We find that this prediction is robust: dislocation curvature and external stress produce little change in the simulation results for junction formation. One key to this success appears to be a separation of timescales, where movement of the far away dislocation arms (under, for example, external stress) is typically slow compared to the process of making a junction. The self-energy calculation we describe gives a rule for dislocation encounters which should allow a considerable saving in computational effort, allowing one to impose correct interaction outcomes without calculating the interactions in detail. We also find that dislocations often come together under attraction without forming a junction. The resulting “cross-linked” state provides an additional type of connection between dislocations. We include preliminary results on the persistence of junctions and cross-linked states under stress.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

[1] PARAllel NOdal Ibm Dislocation code. In this model, the dislocation cores are able to overlap, because the singularity in dislocation interactions has been softened at separations smaller than 2 core radii. The boundary condition we typically use has each long dislocation arm connected to an infinite half-line of matched slope. The PARANOID code is described in Schwarz, K.W., J. Appl. Phys. 85, 108 (1999), and an earlier reference on this junction work is: L. K. Wickham, K. W. Schwarz, J. S. Stölken, Phys. Rev. Lett. 83, 4574 (1999).Google Scholar
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[3] These can be varied from ±20nm to ±400 nm without much effect.Google Scholar
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