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Direct Focused Ion Beam Writing of Printheads for Pattern Transfer Utilizing Microcontact Printing

Published online by Cambridge University Press:  10 February 2011

David M. Longo  and
Robert Hull
David M. Longo
Affiliation:
Department of Materials Science & EngineeringUniversity of Virginia Charlottesville, VA 22904-4745, [email protected]
Robert Hull
Affiliation:
Department of Materials Science & EngineeringUniversity of Virginia Charlottesville, VA 22904-4745, [email protected]
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Abstract

We describe how focused ion beam (FIB) direct write technology may be combined with microcontact printing (μCP) and other pattern transfer techniques to enable nanoscale fabrication of complex patterns over both curved and planar surfaces. Nanoscale printheads are fabricated by direct sputtering or deposition (Pt or SiO2) in the FIB. These printheads are capable of transferring 100 nm features over fields of view up to 1 mm2, onto planar and curved surfaces. We are also investigating the concept of “programmable” printheads by fabrication of individually addressable printhead arrays, coupled with selective desorption of a relevant transfer medium (e.g. hexadecanethiol self-assembled monolayers) by heating or by application of an electric field

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 624: Symposium V – Materials Development for Direct Write Technologies , 2000 , 157
Copyright
Copyright © Materials Research Society 2000

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