Hostname: page-component-586b7cd67f-l7hp2 Total loading time: 0 Render date: 2024-11-26T20:26:52.062Z Has data issue: false hasContentIssue false

Dielectric and Ferroelectric Properties of Sol-Gel Derived PLZT Films

Published online by Cambridge University Press:  15 February 2011

G. Teowee
Affiliation:
Donnelly Corporation, 4545 East Fort Lowell Road, Tucson, AZ 85712.
E.L. Quackenbush
Affiliation:
Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721.
C.D. Baertlein
Affiliation:
Donnelly Corporation, 4545 East Fort Lowell Road, Tucson, AZ 85712.
J.M. Boulton
Affiliation:
Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721.
E.A. Kneer
Affiliation:
Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721.
D.R. Uhlmann
Affiliation:
Department of Materials Science and Engineering, University of Arizona, Tucson, AZ 85721.
Get access

Abstract

There has not been much exploration of PLZT film properties as a function of compostion reported in the literature. A survey of numerous PLZT films covering a wide spectrum of the PLZT phase diagram was undertaken to explore the dependence of film properties on composition. A series of sol-gel derived PLZT films were prepared on platinized Si wafers and fired to 700C to obtain the perovskite phase. The film compositions include PLZT x/65/35, x/20/80, x/53/47 for x = 0, 2, 4, 6, 8, 10 and 12 and 7.5/x/y where x/y = 70/30, 53/47, 20/80 and 0/100. These films were characterized for their dielectric and ferroelectric properties. The films definitely showed a strong dependence of final film properties on composition, providing a valuable tool for the material engineering of ferroelectric film properties.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Ramesh, R., Gilchrist, H., Sands, T., Keramidas, V.G., Mat. Sci. & Eng, B22, 283 (1993).Google Scholar
2. Okada, M. and Tominaga, K., J. Appl. Phys., 71, 1955 (1992).Google Scholar
3. Dimos, D., Lockwood, S.J., Schwartz, R.W., Rodgers, M.S., preprint, pvt. comm., 1994 Google Scholar
4. Haertling, G.H., preprint, pvt. comm., 1993.Google Scholar
5. Kawano, T., Sei, T., Tsuchiya, T., Jpn. J. Appl. Phys., 30, 2178 (1991).Google Scholar
6. Nakagawa, T., Yamaguchi, J., Usuki, T., Matsui, Y., Okuyama, M. and Hamakawa, Y., Jpn. J. Appl. Phys., 18, 897 (1979).Google Scholar
7. Vest, R.W., Xu, J., Ferroelectrics, 93, 21 (1989).Google Scholar
8. Sugiyama, S., Takagi, A., Tsuzuki, K., Jpn. J. Appl. Phys., 30, 2170 (1991).Google Scholar
9. Esener, S. C., Lee, S.H., Krishnakumar, S., Ozguz, V.H. and Fan, C., US Patent 5242707, 1993 Google Scholar
10. Ishida, M., Matsunami, H., Tanaka, T., J. Appl. Phys., 48, 951 (1977).Google Scholar
11. Adachi, H., Mitsuyu, T., Yamazaki, O. and Wasa, K., Proc. 7th IEEE ISAF, 273 (1990).Google Scholar
12. Teowee, G., Boulton, J.M., Lee, S. C. and Uhlmann, D.R., MRS Symp. Proc, 243, 255 (1992).Google Scholar
13. Teowee, G., Boulton, J.M. and Uhlmann, D.R., MRS Symp. Proc, 271, 345 (1992).Google Scholar