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Diagnostics of Pulsed Plasma Fluxes in Laser Deposition of Thin Films

Published online by Cambridge University Press:  15 February 2011

M. Ozegowski ,
S. Metev ,
G. Sepold  and
S. Burmester
M. Ozegowski
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, Klagenfurter Str. 2, 28359 Bremen
S. Metev
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, Klagenfurter Str. 2, 28359 Bremen
G. Sepold
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, Klagenfurter Str. 2, 28359 Bremen
S. Burmester
Affiliation:
BIAS, Bremen Institute of Applied Beam Technology, Klagenfurter Str. 2, 28359 Bremen
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Abstract

This paper presents the main results of an experimental study of the dependence of some important plasma parameters (plasma flux density, multicharge ion content, degree of ionization, energy distribution of the ions) on some laser parameters (light flux density, wavelength) for two laser types (TEA-CO2- and excimer laser). A special experimental method has been developed for an absolute and simultaneous measurement of the plasma parameters. The results obtained show the possibility to control the parameters of plasma fluxes over the deposition conditions and herewith to control the properties of the deposited films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 81
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

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