Hostname: page-component-6bf8c574d5-l72pf Total loading time: 0 Render date: 2025-03-08T05:11:24.721Z Has data issue: false hasContentIssue false
  • English
  • Français

Diagnostics, Mechanisms of Deposition, and Process Control of Thin Fluoropolymeric Films in RF Discharges

Published online by Cambridge University Press:  15 February 2011

R. d'Agostino
R. d'Agostino*
Affiliation:
Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari via Orabona 4, 70126 Bari, Italy, [email protected]
Get access

Abstract

Plasma deposited fluoropolymer films are shown to have composition, chemical structures and properties variable continuously in a very broad range. Films obtained under high fragmentation and structure retention conditions are discussed and compared. The mechanism of deposition is shown to explain etching-deposition competition. Finally, actinometric spectroscopy is discussed briefly as a semi-quantitative diagnostics tool enabling the control of the chemistry of the process under high fragmentation conditions‥

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 476: Symposium N – Low-Dielectric Constant Materials III , 1997 , 185
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. d'Agostino, R., Plasma Deposition. Treatment and Etching of Polymer Films. Academic Press, Boston 1990, and refs. therein.Google Scholar
2. Yasuda, H., Plasma Polymerisation. Academic Press, Boston 1985 Google Scholar
3. d'Agostino, R., Cramarossa, F., Fracassi, F. and Illuzzi, F. in Plasma Deposition. Treatment and Etching of Polymer Films, edited by d'Agostino, R., Academic Press, Boston 1990;Google Scholar
d'Agostino, R., Cramarossa, F., Fracassi, F., De Simoni, E., Sabbatini, L., Zambonin, P.G. and Caporiccio, G., Thin Solid films, 143, 163 (1986);Google Scholar
d'Agostino, R., Favia, P., Fracassi, F., Illuzzi, F., J. Pol. Sci. A: Pol. Chem., 28, 3387 (1990).Google Scholar
4. Kiaei, D., Hoffman, A. S., Ratner, B.D., Horbett, T. A., J. Appl. Pol. Sci.: Polym. Symp., 42, 269 (1988)Google Scholar
5. d'Agostino, R., Cramarossa, F., Fracassi, F., Illuzzi, F., Caporiccio, G., U.S. Patent N. 4791012 (1988); U.S. Patent N. 4869922 (1989)Google Scholar
6. Castner, D. G., Lewis, K. B., Fisher, D. A., Ratner, B. D. and Gland, J. L., Langmuir, 9, 537 (1993);Google Scholar
Castner, D. G., Favia, P. and. Ratner, D., in Surface Modification of Polymeric Biomaterials, edited by Ratner, B. D. and Castner, D. G., Plenum Press, New York, 1996, p. 45 Google Scholar
7. Flamm, D. L. and Herb, G. K. in Plasma Etching an Introduction, edited by Manos, D. M. and Flamm, D. L., Academic Press, Boston 1989, p. 1.Google Scholar
8. Fracassi, F., Occhiello, E., and Coburn, J. W., J. Appl. Phys., 62, 3980 (1987).Google Scholar
9. Coburn, J. W. and Chen, M. J., J. Appl. Phys., 51, 3134 (1990)Google Scholar
10. d'Agostino, R., Cramarossa, F., De Benedictis, S. and Ferraro, G., J. Appl. Phys., 5 2, 1259 (1981).Google Scholar