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Depth Profiling of Molybdenum Thin Films Using Grazing Incidence X-Ray Scattering

Published online by Cambridge University Press:  15 February 2011

Sandra G. Malhotra
Affiliation:
University of Michigan, Department of Materials Science and Eng., Ann Arbor, MI 48109–2136
Z. Rek
Affiliation:
Stanford Synchrotron Radiation Laboratory, Stanford, CA 94305
M. Vill
Affiliation:
University of Michigan, Department of Materials Science and Eng., Ann Arbor, MI 48109–2136
O.P. Karpenko
Affiliation:
University of Michigan, Department of Materials Science and Eng., Ann Arbor, MI 48109–2136
S.M. Yalisove
Affiliation:
University of Michigan, Department of Materials Science and Eng., Ann Arbor, MI 48109–2136
J.C. Bilello
Affiliation:
University of Michigan, Department of Materials Science and Eng., Ann Arbor, MI 48109–2136
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Abstract

It is important that inherent strains (or stresses) be controlled during thin film processing. This study used grazing incidence x-ray scattering (G1XS) to determine the strain gradient present in a ∼1700 Å sputtered molybdenum thin film. In particular, the gradient in the hydrostatic strain was Measured. This observation corresponded to assessing the average change in the lattice parameter as a function of depth throughout the thickness of the film. In addition, the strain ellipsoids, which represent the state of strain in three dimensions, were calculated as a function of film depth. It was shown that the strain varied throughout the ∼1700 Å Mo film thickness and that the principal strains were anisotropic, with one principal strain much larger than the others in Magnitude.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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