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Deposition of Thin Alumina Films from Supercritical Water Jets

Published online by Cambridge University Press:  25 February 2011

J. I. Brand  and
D. R. Miller
J. I. Brand
Affiliation:
Dept. of Applied Mechanics and Engineering Sciences, B-010 University of California, San Diego, La Jolla, Ca. 92093
D. R. Miller
Affiliation:
Dept. of Applied Mechanics and Engineering Sciences, B-010 University of California, San Diego, La Jolla, Ca. 92093
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Abstract

Thin alumina films are grown on a silicon substrate, in vacuum, at a rate of about 10 Å per second, and at substrate temperatures below 1500C. Alumina is dissolved in supercritical water and the resulting solution expanded in a supersonic free jet, which is directed at the substrate. The films are characterized by ESCA and FTIR.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 617
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

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