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Deposition of Precursor Poly - Silicon Films for Flat Panel Display Applications

Published online by Cambridge University Press:  10 February 2011

R. Pethe ,
C. Deshpandey ,
S. Dixit ,
E. Demaray ,
D. Meakin ,
D. Orgill  and
N. Turner
R. Pethe
Affiliation:
Applied Komatsu Technology, Santa Clara, California
C. Deshpandey
Affiliation:
Applied Komatsu Technology, Santa Clara, California
S. Dixit
Affiliation:
Applied Komatsu Technology, Santa Clara, California
E. Demaray
Affiliation:
Applied Komatsu Technology, Santa Clara, California
D. Meakin
Affiliation:
Applied Komatsu Technology, Santa Clara, California
D. Orgill
Affiliation:
Applied Komatsu Technology, Santa Clara, California
N. Turner
Affiliation:
Applied Komatsu Technology, Santa Clara, California
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Large grain poly-Silicon (p-Si) films have been evaluated for high speed TFT for flat panel displays [1,2]. It is expected that with good quality p-Si, “System on Glass” products, in which entire electronic circuitry is incorporated directly onto glass are achievable [3]. This approach therefore has the potential to fabricate Integrated AMLCD's (IAMLCD) and bypass conventional Si wafer based products and integrate CMOS circuits with direct view TFT LCD manufacturing. To realize this potential; it is necessary to develop a production process for depositing repeatable, good quality p-Si films on to large area glass substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 471: Symposium G – Flat Panel Display Materials III , 1997 , 3
Copyright
Copyright © Materials Research Society 1997

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References

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