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Deposition of Nbtex Thin Films Using Laser Ablation: Crystallographic Structure And Spatial Composition of Deposits

Published online by Cambridge University Press:  15 February 2011

H. Sassoli
Affiliation:
URA, C.N.R.S, 783, G.P.E.C
F. Grangeon
Affiliation:
UMR, C.N.R.S, 138, IRPHE LP3, Faculté de Luminy case 901 13288 Marseille FRANCE
Y. Mathey
Affiliation:
URA, C.N.R.S, 783, G.P.E.C
M. Autric
Affiliation:
UMR, C.N.R.S, 138, IRPHE LP3, Faculté de Luminy case 901 13288 Marseille FRANCE
D. Pailharey
Affiliation:
URA, C.N.R.S, 783, G.P.E.C
W. Marine
Affiliation:
URA, C.N.R.S, 783, G.P.E.C
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Abstract

Pulsed laser deposition (PLD ) is known for its capacity to reproduce a target composition on a substrate. We have used this deposition technique to produce thin films of transition metal chalcogenides. However, the deposits were always deficient in Te relative to the starting material ( composed by a refractory metal ( niobium ) and a chalcogene ( tellurium ) ). Variations of the interreticular distances have been observed with respect to fluence and substrate temperature. We show that spatial composition of the films is determined by a degree of crystallinity of deposit and by the reaction of formation of Te2 molecule within laser induced plume Two kinds of deposits have been obtained : Nb5Te4-type thin films which have a one-dimensional structure and NbTe2-type thin films which have a two-dimensional structure. While NbTe2 films have been realized by sputtering, it is the first time that Nb5Te4 films have been deposited.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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