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Deposition Kinetics of a-Si:H and a-SiC:H for Fabrication of a-Si / a-SiC Double-Layered Photoreceptor
Published online by Cambridge University Press: 26 February 2011
Extract
In the fabrication of a-Si photoreceptor for electrophotography (Fig.1), it is important to understand physical and chemical reactions in glow-discharge plasma [1] in order to improve film quality and to achieve high deposition rate [2] and uniformity of the film, because of its thickness of about 30 μm and large area.
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- Copyright © Materials Research Society 1988