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Degradation of Nano-crystalline ITO Films due to Exposure to Hyperthermal Atomic Oxygen

Published online by Cambridge University Press:  26 February 2011

Long Li ,
Ross Harder ,
Fengting Xu ,
Ian K. Robinson  and
Judith C. Yang
Long Li
Affiliation:
[email protected], University of Pittsburgh, MSE, 848 Benedum Hall, Pittsburgh, PA, 15261, United States, 412-6249753, 412-6248069
Ross Harder
Affiliation:
[email protected], University of Illinois at Urbana-Champaign, Department of Physics, United States
Fengting Xu
Affiliation:
[email protected], University of Pittsburgh, Materials Science and Engineering Department, United States
Ian K. Robinson
Affiliation:
[email protected], University of Illinois at Urbana-Champaign, Department of Physics, United States
Judith C. Yang
Affiliation:
[email protected], University of Pittsburgh, Materials Science and Engineering Department, United States
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Abstract

Indium tin oxide (ITO) films coated on float glass slides were exposed to 5 eV hyperthermal atomic oxygen at room temperature with increasing fluences: 2×1019, 6×1019 and 2×1020 O-atoms/cm2. We characterized the structure of the ITO films after room temperature atomic oxygen exposure with scanning electron microscope (SEM) and atomic force microscope (AFM), synchrotron X-ray diffraction (XRD), and cross-sectional transmission electron microscope (X-TEM). The unexposed ITO films were found to possess a nano-crystalline surface, and clean and abrupt ITO/SiO2 interfaces without interfacial phase. Surface roughness of the exposed ITO films increased with the increasing AO influences. The interface- sensitive peaks in XRD measurements with grazing incidence revealed that the crystallinity of the ITO was modified near the interface. Cross-sectional TEM confirmed that many ITO particles with diameters ranging from 2-10 nm formed in the SiO2 substrate near the interface after AO exposure. These findings suggest that O atoms can travel through the ITO films, where the boundaries of columnar-grown grains may supply the pathway.

Keywords

oxideoxidationnanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 887: Symposium Q – Degradation Processes in Nanostructured Materials , 2005 , 0887-Q10-08
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1. Hedin, A. E., Journal of Geophysical Research, [Space Physics] 92, 4649 (1987).Google Scholar
2. Reddy, M. R., Journal of Materials Science 30, 281 (1995).Google Scholar
3. Bouquet, F. L. and Maag, C. R., IEEE Transactions on Nuclear Science NS- 33, 1408 (1986).Google Scholar
4. Chambers, A. R., Harris, I. L., and Roberts, G. T., Materials Letters 26, 121 (1996).Google Scholar
5. Minton, T. K. and Garton, D. J., in Chemical Dynamics in Extreme Environments, edited by Dressler, R. A. (World Scientific, Singapore, 2001).Google Scholar
6. Reddy, M. R., Srinivasamurthy, N., and Agrawal, B. L., Surface and Coatings Technology 58, 1 (1993).Google Scholar
7. Synowicki, R. A. et al. , Surface and Coatings Technology 62, 499 (1993).Google Scholar
8. Woollam, J. A. et al. , Thin Solid Films 241, 218 (1994).Google Scholar
9. Caledonia, G. E., Krech, R. H., and Green, B. D., AIAA Journal 25, 59 (1987).Google Scholar
10. Rutledge, S. K. et al. , J Am Inst Conserv 39, 65 (2000).Google Scholar
11. Chopra, K. L., Major, S., and Pandya, D. K., Thin Solid Films 102, 1 (1983).Google Scholar
12. Fan, J. C. C. and Goodenough, J. B., Journal of Applied Physics 48, 3524 (1977).Google Scholar
13. Wang, R. X. et al. , Journal of Applied Physics 97, 033504(2005).Google Scholar