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Degradation in Euv Reflectance of Ion-Sputtered Sic Films

Published online by Cambridge University Press:  21 February 2011

Dan Schwarcz  and
Ritva A.M. Keski-Kuha
Dan Schwarcz
Affiliation:
NASA Goddard Space Flight Center, Code 717.1, Greenbelt, MD 20771
Ritva A.M. Keski-Kuha
Affiliation:
NASA Goddard Space Flight Center, Code 717.1, Greenbelt, MD 20771
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Abstract

Silicon Carbide (SiC) formed by chemical vapor deposition (CVD) has the highest reflectivity in the extreme ultraviolet (EUV) of any currently used optical material. The high temperature required for the CVD process, however, limits its suitability for coating optical components. To address this problem thin films have been sputtered onto optical surfaces from CVD βSiC targets. These films, while having reflectivity lower than that of CVD SiC, are nonetheless the best coatings available for reflectance in the spectral region below 1000À. While the initial properties are good, the EUV reflectivity degrades with time after deposition. A relative decrease of about 25% is evident in the reflectivity at 920Â after 2.5 years, and about 85% of this change occurs in the first three months. In fact, a decrease is observed in the minutes following deposition. In this study the degradation is characterized and a mechanism is proposed. Efforts underway to reduce or eliminate the degradation are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 354: Symposium A – Beam Solid Interactions for Materials Synthesis and Characterization , 1994 , 535
Copyright
Copyright © Materials Research Society 1995

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References

1 Osantowski, J.F., Keski-Kuha, R.A.M., Herzig, H., Toft, A.R., Gum, J.S. and Fleetwood, C.M., Adv. Space Res. 11, 185 (1991)Google Scholar
2 Choyke, W.J., Partlow, W.D., Supertzi, E.P., Venskytis, F.J., and Brandt, G.B., Appl. Opt. 16, 2841 (1977)Google Scholar
3 Keski-Kuha, R.A.M., Gum, J.S., Osantowski, J.F., and Fleetwood, C.M., SPIE 1742, 384 (1992)Google Scholar
4 Keski-Kuha, Ritva A.M., Osantowski, John F., Herzig, Howard, Gum, Jeffrey S., and Toft, Albert R., Appl. Opt. 27, 2815 (1988)Google Scholar
5 Blumenstock, G. and Keski-Kuha, R.A.M. (private communication.)Google Scholar
6 Thornton, J.A., Ann. Rev. Mater. Sei., 7, 239 (1977)Google Scholar
7 Ohring, M., The Materials Science of Thin Films, (Academic Press, New York, 1992) p. 520 Google Scholar
8 Martin, P.J., J. Mater. Sei., 21, 1 (1986)Google Scholar