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CVD Precursors Containing Hydropyridine Ligands

Published online by Cambridge University Press:  15 February 2011

Roy G. Gordon ,
John Thornton  and
Feng Chen
Roy G. Gordon
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138.
John Thornton
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138.
Feng Chen
Affiliation:
Department of Chemistry, Harvard University, Cambridge, MA 02138.
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Abstract

Hydropyridine is introduced as a new ligand for use in constructing precursors for chemical vapor deposition. Detachment of hydropyridine occurs by a low-temperature reaction leaving hydrogen in place of the hydropyridine, and a very stable byproduct, pyridine vapor. Hydropyridine ligands can be attached to a variety of elements, including main group metals, such as aluminum and antimony, transition metals, such as titanium and tantalum, semiconductors such as silicon, and nonmetals such as phosphorus and arsenic.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 183
Copyright
Copyright © Materials Research Society 1995

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