Hostname: page-component-cd9895bd7-8ctnn Total loading time: 0 Render date: 2024-12-27T01:44:48.136Z Has data issue: false hasContentIssue false
  • English
  • Français

Cu-Cr Multilayers and Metastable Alloy Films

Published online by Cambridge University Press:  21 February 2011

A.P. Payne  and
B.M. Clemens
A.P. Payne
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford Ca. 94305–2201
B.M. Clemens
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford Ca. 94305–2201
Get access

Extract

A notable aspect of the copper-chromium phase diagram is the strong chemical aversion between the two elements. At room temperature, the solubility of chromium in copper is limited to .02%, while that of copper in chromium is believed to be even less [1]. The elements are even immiscible in the liquid state, exhibiting a miscibility gap which persists to an undetermined temperature. Cu-Cr alloys are of technological interest in applications ranging from electrical switches [2] to catalysis [3]. Fabrication of Cu-Cr alloys is hindered, however, by the large positive heat of mixing exhibited by the system. Cu-Cr multilayers are also of technological interest for application as soft x-ray mirrors [4]. Here the limited mutual solubility of the constituents is advantageous since interfacial mixing is reduced. In this study, we show that vapor deposition can be used to achieve complete solubility in the Cu-Cr system. On the other hand we present evidence suggesting that Cu-Cr multilayers possess sharp composition modulations with little interface mixing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 39
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Hansen, M., Constitution of Binary Alloys, 2nd ed. (McGraw-Hill, New York, 1958).Google Scholar
[2] Hamman, J.F., Siemens Forsch. Entwicklungsber. 2, 210 (1980).Google Scholar
[3] Private communications, Clemens, B.M., (1990).Google Scholar
[4] Private communications, Stearns, M.B., (1990).Google Scholar
[5] Falkenhagen, G. and Hofmann, W., Z. Metallkd. 43, 69 (1952).Google Scholar
[6] Westendorp, J.F.M., Koelwijn, W., Sark, W.G.J.H.M. van, Saris, F.W., Pers, N. M van den, Keijser, Th. H. de, J. Mater. Res. 1, 5 (1986).Google Scholar
[7] Draper, C.W., Jacobson, D.C., Gibson, J.M, Poate, J.M., Vandenberg, J.M, and Cullis, A.G., in Laser and Electron beam Interactions with Solids, edited by Appleton, B.R. and Cellar, G.K. (North Holland, NewYork,1983).Google Scholar
[8] Dirks, A.G., Broek, J.J. van den, J.Vac. Sci Technol. A 3, 6 (1985).Google Scholar
[9] Doerner, M.F., Brennan, S., J. Appl. Phys. 1, 63 (1988).Google Scholar
[10] Kaufman, L. and Bernstein, H., Computer Calculation of Phase Diagrams (Academic Press, New York, 1970).Google Scholar
[11] Mediema, A.R., Philips Technical Review, 8, 36 (1976).Google Scholar
[12] Clemens, B.M., Gay, J.G., Phys. Rev. B, 35,17 (1986).Google Scholar
[13] Clemens, B.M., Sinclair, R., MRS Bulletin, 15,2 (1990).Google Scholar