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Cubic Boron Nitride Prepared by an ECR Plasma

Published online by Cambridge University Press:  16 February 2011

Y. Osaka
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
M. Okamoto
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
Y. Utsumi
Affiliation:
Department of Electrical Engineering, Hiroshima University, Higashihiroshima 724, Japan
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Abstract

A number of deposition techniques for cubic BN films from the vapor phase at low pressures have been proposed. We show that the essential factor for creating cubic BN films is a negative self-bias applied to the substrate. The optical and mechanical properties of the deposited films are characterized by reflectance and stress measurements, respectively.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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References

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