Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-25T15:26:10.496Z Has data issue: false hasContentIssue false

Crystallographically-Oriented Electrochemically-Deposited Bismuth Nanowires

Published online by Cambridge University Press:  01 February 2011

Oded Rabin
Affiliation:
Dept. of Chemistry, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
Gang Chen
Affiliation:
Dept. of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
Mildred S. Dresselhaus
Affiliation:
Dept. of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A. Dept. of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
Get access

Abstract

Bismuth nanowires 200 nm in diameter were synthesized via electrochemical deposition into the pores of anodic alumina templates. A near neutral pH solution and a special sample holder were employed. Both polycrystalline and (012) oriented bismuth nanowire arrays were prepared. The electrical resistance of the samples versus temperature was measured in the range 2–300 K, and the results were fitted to a transport model. Despite the crystallographic alignment of the nanowire array, the model calculations suggest the dominance of a temperature independent scattering mechanism (such as grain boundary or nanowire boundary scattering). The results are compared to the electrical resistance of nanowires formed by impregnation techniques.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Dresselhaus, M. S. et al., in Recent Trends in Thermoelectric Materials Research III, edited by Tritt, T. M. (Academic Press, San Diego, 2001), p. 1.Google Scholar
2. Piraux, L. et al., J. Mater. Res. 14, 3042 (1999).Google Scholar
3. Liu, K., Chien, C. L., Searson, P. C. and Yu-Zhang, K., Appl. Phys. Lett. 73, 1436 (1998).Google Scholar
4. Zhang, Z. B., Ying, J. Y. and Dresselhaus, M. S., J. Mater. Res. 13, 1745 (1998).Google Scholar
5. Huber, T. E., Celestine, K. and Graf, M. J., Phys. Rev. B 67, 245317 (2003).Google Scholar
6. Heremans, J. et al., Phys. Rev. B 61, 2921 (2000).Google Scholar
7. Rabin, O., unpublished.Google Scholar
8. Lin, Y.-M. et al., Appl. Phys. Lett. 76, 3944 (2000).Google Scholar