Hostname: page-component-78c5997874-g7gxr Total loading time: 0 Render date: 2024-11-05T12:15:55.569Z Has data issue: false hasContentIssue false
  • English
  • Français

Critical Current Density and Microstructure of Yba2Cu3O7-X Films as a Function of Film Thickness

Published online by Cambridge University Press:  28 February 2011

A. Mogro-Campero ,
L.G. Turner ,
E.L. Hall  and
N. Lewis
A. Mogro-Campero
Affiliation:
Ge Research and Development Center, Schenectady, NY 12301
L.G. Turner
Affiliation:
Ge Research and Development Center, Schenectady, NY 12301
E.L. Hall
Affiliation:
Ge Research and Development Center, Schenectady, NY 12301
N. Lewis
Affiliation:
Ge Research and Development Center, Schenectady, NY 12301
Get access

Abstract

Thin films of nominal composition YBa2Cu3O7‐x (YBCO) were produced on (100) SrTiO3 substrates by coevaporation and furnace annealing. Film thicknesses in the range of 0.2 to 2.4/μm were analyzed. Microstructural investigations by cross sectional transmission electron microscopy (TEM) reveal a continuous layer of about 0.4 μm thickness adjacent to the substrate with c‐axis normal to the substrate plane. In thicker films the remaining top portion has the c‐axis in the film plane. The critical current density (J ) at 77 K decreases with increasing thickness in the thickness range exceeding 0.4 μm, qualitatively consistent with the microstructural observations, but quantitatively inconsistent with a simple model based on the microstructural data.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 703
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Akoh, H., Shinoki, F., Takahashi, M., and Takada, S., Appl. Phys. Lett. 52, 1732 (1988).Google Scholar
2 Luborsky, F.E., Kwasnick, R.F., Borst, K., Garbauskas, M.F., Hall, E.L., and Curran, M.J., J. Appl. Phys. 64, 6388 (1988).Google Scholar
3 Mogro‐Campero, A. and Turner, L.G., Supercond. Sci. Technol. 1, 269 (1989).Google Scholar
4 Mogro‐Campero, A., Turner, L.G., and Hall, E.L., J. Appl. Phys. 65, 4951 (1989).Google Scholar