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The Correlation of Stress-State and Nano-Mechanical Properties in Au

Published online by Cambridge University Press:  10 February 2011

K. F. Jarausch
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7918 Surfaces and Interfaces Department Sandia National Laboratories, Albuquerque, NM 87185-1413
J. D. Kiely
Affiliation:
Surfaces and Interfaces Department Sandia National Laboratories, Albuquerque, NM 87185-1413
J. E. Houston
Affiliation:
Surfaces and Interfaces Department Sandia National Laboratories, Albuquerque, NM 87185-1413
P. E. Russell
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7918
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Abstract

A dependence of elastic response on the stress-state of a thin-film has been demonstrated using the interfacial force microscope (IFM). Indentation response was measured as a function of the applied biaxial stress-state for 100 nm thick Au films. An increase in measured elastic modulus with applied compressive stress, and a decrease with applied tensile stress was observed. Measurements of elastic modulus before and after applying stress were identical indicating that the observed change in response is not due to a permanent change in film properties.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

[1] LaFontaine, W. R., Paszkiet, C. A., Korhonen, M. A., Li, Ghe-Yu, J. Mater. Res. 6 (1991) 2084.Google Scholar
[2] Vanlandingham, M. R., Knight, S. H., Palmese, G. R., Elings, J. R., Huang, X., Bogetti, T. A., Eduljee, R. F., and Gillespie, J. W. Jr, In press.Google Scholar
[3] Tangyungong, P., Thomas, R. C., Houston, J. E., Michalske, T. A., Crooks, R. M., Howard, A. J., Phys. Rev. Lett. 71 (1993) 3319.Google Scholar
[4] Strojny, A., Gerberich, W. W., Submitted to MRS Bulletin, Proceedings from Spring MRS'98.Google Scholar
[5] Tsui, T. Y., Oliver, W. C., Pharr, G. M., J. Mater. Res., 11 (1996) 752.Google Scholar
[6] Bolshakov, A., Oliver, W. C., Pharr, G. M., J. Mater. Res., 11 (1996) 760.Google Scholar
[7] Denver Instruments XE-50Google Scholar
[8] Sneddon, I. N., Int. J. Engng Sci. 3 (1965) 47.Google Scholar
[9] Russell, P. E., Stark, T. J., Griffis, D. P., Phillips, J. R., Jarausch, K. F., Submitted to J.V.S.T., Proceedings from 1997 Japan-USA Seminar on the Formation of Ion Nanobeams and Applications to Materials Processing.Google Scholar
[10] JEOL 6400FEGoogle Scholar
[11] NT-MDT, www.ntmdt.ruGoogle Scholar
[12] Shenderova, O., Mewkill, P., Brenner, D. W., Jarausch, K., Russell, P. E., Submitted to MRS Bulletin, Proceedings from Spring MRS'98.Google Scholar