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Contamination Control in SIMOX Implanters

Published online by Cambridge University Press:  28 February 2011

Bernhard Cordts  and
Michael Guerra
Bernhard Cordts
Affiliation:
Eaton Corporation, 108 Cherry Hill Drive, Beverly, MA 01930
Michael Guerra
Affiliation:
IBIS Corporation, 32 Cherry Hill Drive, Danvers, MA 01923
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Abstract

The Semiconductor Equipment Division of Eaton has, for the past year, supplied Simox wafers to various companies and laboratories throughout the world. A review will be presented of the operation in a production mode of the NV-200 Oxygen Implanter. Improvements in the production version will be related to both particulate counts and elemental contamination on the wafers. The addition of a polysilicon liner in the beamline has greatly reduced the heavy metal and carbon contamination levels in the machine. Historical Sims and Auger data will be presented to show these effects. The most recent production machine is operating on the manufacturing floor. Sims data from wafers implanted in October 1987 will be presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 107: Symposium H – Silicon-on-Insulator and Buried Metals in Semiconductors , 1987 , 147
Copyright
Copyright © Materials Research Society 1988

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References

1 Jastrzebski, L., Cullen, G., SRI Corporation. Private CommunicationGoogle Scholar
2 Supported in part by Air Force contract #Fl9628-86-C-0068.Google Scholar
3 All SIMS work was performed by C. Evans Associates. Graphs and figure preparation is courtesy of B. Wilson, Hughes Aircraft Corp.Google Scholar
4 Private communication B. Wilson, Hughes Aircraft.Google Scholar
5 C.E. Daniel Chen paper H9.2 this conference proceedings.Google Scholar
6 P.K. Vasudev late news paper H10.3 this conference proceedings.Google Scholar