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The Confining Potential for Carriers in Planar Doped GaAs and the Effect of Photoexcitation

Published online by Cambridge University Press:  21 February 2011

D. Richards
Affiliation:
Fraunhofer-Institut fir Angewandte Festkörperphysik, Tullastrasse 72, D-7800 Freiburg, FRG
J. Wagner
Affiliation:
Fraunhofer-Institut fir Angewandte Festkörperphysik, Tullastrasse 72, D-7800 Freiburg, FRG
K. Ploog
Affiliation:
Max-Planck-Institut fir Festkörperforschung, Heisenbergstrasse 1, D-7000 Stuttgart 80, FRG
A. Fischer
Affiliation:
Max-Planck-Institut fir Festkörperforschung, Heisenbergstrasse 1, D-7000 Stuttgart 80, FRG
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Abstract

Single Be and Si δ-doped layers in GaAs have been investigated by Raman spectroscopy. GaAs/AlxGa1-xAs heterointerfaces, placed 30nm from the dopant spike on either side, facilitate optical measurements by the confinement of photogenerated minority carriers. Self-consistent subband calculations have been performed to compute the subband structure of the two-dimensional electron or hole gas which is confined by the space-charge induced potential well at the δ-doping layer. Upon increasing photoexcitation, the increase in density of photocreated electrons in the Be structure is clearly seen in the polarised Raman scattering spectrum by the appearance, and subsequent increase in frequency, of the electron plasmon modes. The electric field at the top GaAs/AlxGa1-xAs interface is monitored by measuring the strength of electric field induced LO phonon scattering.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. For a recent review see Ploog, K., Hauser, M., and Fischer, A., Appl. Phys. A45, 233 (1988); E.F. Schubert, J. Vac. Sci. Technol. A8, 2980 (1990).CrossRefGoogle Scholar
2. Koch, F. and Zrenner, A., Mater. Sci. Eng. B1, 221 (1989), and references therein.CrossRefGoogle Scholar
3. Wagner, J., Ramsteiner, M., Stolz, W., Hauser, M., Ploog, K., Appl. Phys. Lett. 55, 978 (1989).CrossRefGoogle Scholar
4. Wagner, J., Ramsteiner, M., Richards, D., Fasol, G., and Ploog, K., Appl. Phys. Lett. 58, 143 (1991).CrossRefGoogle Scholar
5. Schubert, E.F., Kuo, J.M., Kopf, R.F., Luftman, H.S., Hopkins, L.C., and Sauer, N.J., J. Appl. Phys. 67, 1969 (1990).CrossRefGoogle Scholar
6. Wagner, J., Ruiz, A., and Pioog, K., Phys. Rev. B 43, 12134 (1991).CrossRefGoogle Scholar
7. Richards, D., Wagner, J., Schneider, H., Hendorfer, G., Maier, M., Fischer, A., and Ploog, K., submitted to Phys. Rev. B.Google Scholar
8. Wagner, J., Fischer, A., and Ploog, K., Appl. Phys. Lett. 59, 428 (1991).CrossRefGoogle Scholar
9. See e.g., Dawson, P. and Woodbridge, K., Appl. Phys. Lett. 45, 1227 (1984); G.D. Gillard, D.J. Wolford, T.F. Kuech, and J.A. Bradley, Phys. Rev. B43, 14251 (1991).CrossRefGoogle Scholar
10. Schiffler, F., and Abstreiter, G., Phys. Rev. B 34, 4017 (1986).CrossRefGoogle Scholar
11. Shen, H., Parayanthai, P., Pollack, F.H., Sacks, R.N., and Hickman, G., Solid State Commun. 63, 357 (1987).CrossRefGoogle Scholar
12. Pletschen, W., Wagner, J., Kaufel, G., and Köhler, K., Appl. Phys. Lett. 59, 2299 (1991).CrossRefGoogle Scholar
13. Ekenberg, U., and Altarelli, M., Phys. Rev. B 32, 3712 (1985).CrossRefGoogle Scholar
14. O'Reilly, E.P., Semicond. Sci. Technol. 4, 121 (1989).CrossRefGoogle Scholar
15. Luttinger, J.M. and Kohn, W., Phys. Rev. 97, 869 (1955); J.M. Luttinger, Phys. Rev. 102, 1030 (1956).CrossRefGoogle Scholar
16. Ekenberg, U., and Richards, D.R., in Proc. of the 20th Int. Conf. on the Physics of Semiconductors, edited by Anastassakis, E.M. and Joanopoulos, J.D. (World Scientific, Singapore, 1990) p. 1009.Google Scholar
17. Cardona, M. and Harbeke, G., J. Appl. Phys. 34, 813 (1962).CrossRefGoogle Scholar
18. Pinczuk, A., and Abstreiter, G., in Light Scattering in Solids V, edited by Cardona, M. and Göntherodt, G. (Springer-Verlag, Berlin, Heidelberg, New York, 1989), p. 153.CrossRefGoogle Scholar
19. Cedeira, F., Fjeldly, T.A., and Cardona, M., Phys. Rev. B 8, 4734 (1973).CrossRefGoogle Scholar
20. Yablonovitch, E., Skromme, B.J., Bhat, R., Harbison, J.P., and Gmitter, J.J., Appl. Phys. Lett. 54, 555 (1989).CrossRefGoogle Scholar