Hostname: page-component-6bf8c574d5-2jptb Total loading time: 0 Render date: 2025-02-19T20:59:41.490Z Has data issue: false hasContentIssue false

Conduction Mechanisms In Crystallized Silicon Films OnMolybdenum Substrates

Published online by Cambridge University Press:  15 February 2011

J. Palmer
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Center for Electronic and Electro-Optic Materials, 215 Bonner Hall, Buffalo, NY 14260
J. Yi
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Center for Electronic and Electro-Optic Materials, 215 Bonner Hall, Buffalo, NY 14260
R. Wallace
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Center for Electronic and Electro-Optic Materials, 215 Bonner Hall, Buffalo, NY 14260
W. Anderson
Affiliation:
State University of New York at Buffalo, Department of Electrical and Computer Engineering, Center for Electronic and Electro-Optic Materials, 215 Bonner Hall, Buffalo, NY 14260
Get access

Abstract

Hydrogenated Amorphous silicon films deposited on molybdenum sheet metalsubstrates have been crystallized by thermal annealing at 850°C for 4 hoursin a nitrogen atmosphere. X-ray diffraction and scanning electron microscopyresults indicated that the average grain size in the crystallized films wasapproximately 200A. Palladium contacts were fabricated and the resultingPd/Si/Mo structures were electrically characterized.Current-voltage-temperature measurements for phosphorus doped and undopedannealed samples resulted in a J “V characteristic consistent withspace-charge-limited current. Using this data, Mobility as a function oftemperature from 100K-300K was obtained. In phosphorus doped samples, themobility appeared to be limited by energy barriers at the grain boundaries.In undoped samples, a σ “T’ exp (-b/T’) temperature dependence consistentwith variable-range hopping conduction was observed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Green, M., Blakers, A., Zhao, J., Milne, A., Wang, A., and Dai, X., IEEE Trans. Elec. Dev. 37 (4), 331336 (1990).Google Scholar
2. Arai, Y., Ishii, M., Shinohara, H., and Yamazaki, S., IEEE Elec. Dev. Let. 12 (8), 460461 (1991).Google Scholar
3. Staebler, D. and Wronski, C., Appl. Phys. Let. 31 (4), 292294 (1977).Google Scholar
4. Yi, J., Wallace, R., Sridhar, N., Wang, Z., Xie, K., Chung, D., Wie, C., Etemadi, K., Anderson, W., Periard, M., Cochrane, R., Diawara, Y., Currie, J., and Coleman, J., Solar Cells 30 (1–4), 403413 (1991).Google Scholar
5. Cullity, B., Elements of X-Rav Diffraction. 2nd ed. (Addison-Wesley Publishing, 1978), p. 102.Google Scholar
6. Sakai, A., Ono, H., Ishida, K., Niino, T., and Tatsumi, T., Jap. J. Appl. Phys. 30 (6A) L941-L943 (1991).Google Scholar
7. Korin, E., Reif, R., and Mikic, B., Thin Solid Films 167, 101106 (1988).Google Scholar
8. Mott, N. and Gurney, R., Electronic Processes in Ionic Crystals. 2nd ed. (Dover Publications, 1964), pp. 168173.Google Scholar
9. Grinberg, A., Luryi, S., Pinto, M., and Schryer, N., IEEE Trans. Elec. Dev. 36 (6), 11621170 (1989).Google Scholar
10. Jeanjean, P., Sellitto, P., Sicart, J., Robert, J., Chaussemy, G., and Laugier, A., Semicond. Sci. and Tech. 6, 11301134 (1991).Google Scholar
Solmi, U.S., Severi, M., Angelucci, R., Baldi, L., and Bilenchi, R., J. Electrochem. Soc. 129 (8), 18111818 (1982).Google Scholar
12. Queirolo, G., Servida, E., Baldi, L., Pignatel, G., Armigliato, A., Frabboni, S., and Corticelli, F., J. Electrochem. Soc. 137 (3), 967971 (1990).Google Scholar
13. Seto, J., J. Appl. Phys. 46 (12), 52475254 (1975).Google Scholar
14. Mott, N. and Davis, E., Electronic Processes in Non-Crystalline Materials. (Clarendon Press, 1979), pp. 3237.Google Scholar
15. Sharma, R., Shukla, A., Kapoor, A., Srivastava, R., and Mathur, P., J. Appl. Phys. 57 (6), 20262029 (1985).Google Scholar
16. Dimitriadis, C. and Coxon, P., J. Appl. Phys. 64 (3), 16011604 (1988).Google Scholar
17. Knotek, M., Solid State Com. 17 (11), 14311433 (1975).Google Scholar