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Conduction Mechanisms In Crystallized Silicon Films OnMolybdenum Substrates
Published online by Cambridge University Press: 15 February 2011
Abstract
Hydrogenated Amorphous silicon films deposited on molybdenum sheet metalsubstrates have been crystallized by thermal annealing at 850°C for 4 hoursin a nitrogen atmosphere. X-ray diffraction and scanning electron microscopyresults indicated that the average grain size in the crystallized films wasapproximately 200A. Palladium contacts were fabricated and the resultingPd/Si/Mo structures were electrically characterized.Current-voltage-temperature measurements for phosphorus doped and undopedannealed samples resulted in a J “V characteristic consistent withspace-charge-limited current. Using this data, Mobility as a function oftemperature from 100K-300K was obtained. In phosphorus doped samples, themobility appeared to be limited by energy barriers at the grain boundaries.In undoped samples, a σ “T’ exp (-b/T’) temperature dependence consistentwith variable-range hopping conduction was observed.
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- Copyright © Materials Research Society 1994
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