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Computer Controlled Pulsed Pecvd Reactor for Laboratory Scale Deposition of Plasma Polymerized Thin Films

Published online by Cambridge University Press:  10 February 2011

P. D. Pedrow ,
L. V. Shepsis ,
R. Mahalingam  and
M. A. Osman
P. D. Pedrow
Affiliation:
EECS Department, Washington State University, Pullman, WA 99164
L. V. Shepsis
Affiliation:
ChE Department, Washington State University, Pullman, WA 99164
R. Mahalingam
Affiliation:
ChE Department, Washington State University, Pullman, WA 99164
M. A. Osman
Affiliation:
EECS Department, Washington State University, Pullman, WA 99164
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Abstract

A pulsed PECVD reactor has been successfully constructed for laboratory scale studies of plasma polymerized thin films. A computer control system based on National Instrument's LABVIEW software controls power supply sequence, feed injection, and introduction of RF energy. An optical fiber and a photo diode allow the user to monitor the emitted light for each pulse. A fast ionization gauge is used to characterize the pressure evolution over time, subsequent to acetylene gas injection. Substrates with diameter as large as 10 cm can be accommodated within the reactor. Both aniline liquid and acetylene gas have been used as reactor feed. The deposited plasma-polymerized films were characterized using AFM and SEM. Electrical conductivity of plasma polymerized acetylene film was also measured

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 600: Symposium FF – Electroactive Polymers , 1999 , 325
Copyright
Copyright © Materials Research Society 2000

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