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Computationally Efficient Model for 2D Ion Implantation Simulation
Published online by Cambridge University Press: 10 February 2011
Abstract
A computationally efficient method for ion implantation simulation is presented. The method allows two-dimensional ion implantation profiles in arbitrary shaped structures to be calculated and is valid for both amorphous and crystalline materials. It uses an extension of the one-dimensional dual Pearson approximation into the second dimension.
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- Copyright © Materials Research Society 1998
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