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Composite Nanocrystalline/Amorphous Thin Films for Particle Detector Applications

Published online by Cambridge University Press:  08 October 2015

Zvie Razieli ,
Roger Rusack  and
James Kakalios
Zvie Razieli
Affiliation:
Department of Physics and Astronomy, University of Minnesota, Minneapolis, MN, 55455, U.S.A.
Roger Rusack
Affiliation:
Department of Physics and Astronomy, University of Minnesota, Minneapolis, MN, 55455, U.S.A.
James Kakalios
Affiliation:
Department of Physics and Astronomy, University of Minnesota, Minneapolis, MN, 55455, U.S.A.
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Abstract

Thin films of amorphous silicon with nanocrystalline silicon inclusions are fabricated using a dual plasma PECVD co-deposition system. Raman spectroscopy and X-ray diffraction confirmed the crystallinity of the embedded nanocrystals as well as their diameter, which is varied from 4.3 nm to 17.5 nm. The dark conductivity of the films is highly dependent on the crystal fraction, with a maximum room temperature conductivity found for a crystal concentration of 5.5%, well below the percolation threshold. Proton irradiation at energies of 217 MeV with a total fluence of 5 x1012 protons/cm2 caused no significant radiation damage. The enhancement of the conductivity, along with the absence of radiation damage suggests this material may be a candidate for use in the next generation of particle detectors in the Compact Muon Solenoid in the Large Hadron Collider at CERN.

Keywords

amorphousthin filmradiation effects
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1770: Symposium A – Emerging Silicon Science and Technology , 2015 , pp. 49 - 54
Copyright
Copyright © Materials Research Society 2015 

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