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A Comparative Study Between high and low Temperature ThermallyControlled Crystallization of thin films

Published online by Cambridge University Press:  15 February 2011

Richard D. Robinson  and
Ioannis N. Miaoulis
Richard D. Robinson
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
Ioannis N. Miaoulis
Affiliation:
Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, MA 02155
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Abstract

Numerical simulation of zone-Melting recrystallization (ZMR) was conductedto determine the heat transfer dynamics over a wide range of temperatures.ZMR is a thermal processing technique used to recrystallize Materials.Therefore, the thermal effects induced by the ZMR process critically affectthe crystallization dynamics. Parametric studies indicated that theconductive heat flux from the heat source through the gas accounted for atleast 15% of the total energy heating the film for materials with meltingpoints less than 800°C. The influence of this conductive heating has beenneglected in past analyses. Also, Materials with higher melting points areless sensitive to changes in the heat flux from the heat source. Slightvariations of thermal gradients in the film can lead to different qualitiesof crystal, so care must be taken when processing materials with lowermelting points, since they are more sensitive to temperature variation. Thispaper analyzes the dominant modes of heat transfer in ZMR over a wide rangeof temperatures that influence the recrystallization dynamics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 321: Symposium E – Crystallization and Related Phenomena in Amorphous Materials—Ceramics, Metals, Polymers, and Semiconductors , 1993 , 627
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1. Chen, C.K., Geis, M. W., Tsaur, B-Y., Chapman, R. L., and Fan, J. C. C., J. Electrochem. Soc. 131, 1707 (1984)Google Scholar
2. Miaoulis, I. N., Wong, P. Y., Lipman, J. D., and Im, J. S., J. Appl. Phys. 69, 7273 (1991)Google Scholar
3. Pfeiffer, L., Gelman, A. E., Jackson, K. A., and West, K. W., Mat. Res. Soc. Proc. 74, 543 (1987)Google Scholar
4. Mertens, P. W., Thesis, Katholieke Universiteit Leuven, Belgium 1991, (University Microfilms Incorporated dissertation services, Ann Arbor, MI, 1992)Google Scholar
5. Robinson, R. D. and Miaoulis, I. N., J. Appl. Phys. 73, 439 (1993)Google Scholar
6. Im, J. S., Chen, C. K., Thompson, C. V., Geis, M. W. and Tomita, H., Mat. Res. Soc. Proc. 107, 169 (1988)Google Scholar
7. Dutartre, D., Mat. Sci. Eng. B 4, 211 (1989)Google Scholar
8. Geis, M. W., Smith, H. I., Silversmith, D. J., Mountain, R. W., and Thompson, C. V., J. Electrochem. Soc. 130, 1178 (1983)Google Scholar
9. Jackson, K. A. and Kurtze, D. A., J. Cryst. Growth 71, 385 (1985)Google Scholar
10. Im, J. S., Lipman, J. D., Miaoulis, I. N., Chen, C. K. and Thompson, C. V., Mater. Res. Soc. Proc. 157, 455 (1990)Google Scholar
11. Yoon, S. Y. and Miaoulis, I. N., J. Mater. Res. 7, 124 (1992)Google Scholar
12. Zavracky, P. M., “Silicon-on-insulator Wafers by Zone Melting Recrystallization,” Solid State Technology 34, 55 (1991)Google Scholar
13. Robinson, R. D. and Miaoulis, I. N., J. Appl. Phys. (to be published Feb. 1994)Google Scholar
14. Heilman, B. D., Marston, M. A., Wong, P. Y. and Miaoulis, I. N., J. Mater. Res. 8, 551 (1993)Google Scholar
15. Mullins, W. W. and Sekerka, R. F., J. Appl. Phys. 35, 444 (1964)Google Scholar
16. Flomerics Limited, The Flotherm Reference Manual (England, 1992)Google Scholar
17. Lipman, J. D., Thesis, Tufts University, 1989 Google Scholar
18. Lipman, J. D., Wong, P. Y., Miaoulis, I. N., and Im, J. S., HTD- Vol. 123, Collected Papers in Heat Transfer, The American Society of Mechanical Engineers, pp. 211–217, Dec. 1989.Google Scholar