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Comparative Studies of Ultra Low-κ Porous Silica Films with 2-DHexagonal and Disordered Pore Structures

Published online by Cambridge University Press:  17 March 2011

Nobutoshi Fujii ,
Kazuhiro Yamada ,
Yoshiaki Oku ,
Nobuhiro Hata ,
Yutaka Seino ,
Chie Negoro  and
Takamaro Kikkawa
Nobutoshi Fujii
Affiliation:
MIRAI-ASET, Tsukuba, Japan
Kazuhiro Yamada
Affiliation:
MIRAI-ASET, Tsukuba, Japan
Yoshiaki Oku
Affiliation:
MIRAI-ASET, Tsukuba, Japan
Nobuhiro Hata
Affiliation:
MIRAI-ASRC-AIST, Tsukuba, Japan
Yutaka Seino
Affiliation:
MIRAI-ASRC-AIST, Tsukuba, Japan
Chie Negoro
Affiliation:
MIRAI-ASRC-AIST, Tsukuba, Japan
Takamaro Kikkawa
Affiliation:
MIRAI-ASRC-AIST, Tsukuba, Japan RCNS, Hiroshima Univ., Higashi-Hiroshima, Japan
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Abstract

Periodic 2-dimensional (2-D) hexagonal and the disordered pore structuresilica films have been developed using nonionic surfactants as thetemplates. The pore structure was controlled by the static electricalinteraction between the micelle of the surfactant and the silica oligomer.No X-ray diffraction peaks were observed for the disordered mesoporoussilica films, while the pore diameters of 2.0-4.0 nm could be measured bysmall angle X-ray scattering spectroscopy. By comparing the properties ofthe 2-D hexagonal and the disordered porous silica films which have the sameporosity, it is found that the disordered porous silica film has advantagesin terms of the dielectric constant and Young's modulus as well as thehardness. The disordered porous silica film is more suitable for theinterlayer dielectrics for ULSI.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 812: Symposium F – Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2004 , 2004 , F4.10
Copyright
Copyright © Materials Research Society 2004

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