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Compact and Efficient HFCVD for Electronic Grade Diamond and Related Materials

Published online by Cambridge University Press:  31 January 2011

R. Vispute ,
Andrew Seiser ,
Geun Lee ,
Jaurette Dozier ,
Jeremy Feldman ,
Lance Robinson ,
Bradley Zayac  and
Alden Grobicki
R. Vispute
Affiliation:
[email protected], United States
Andrew Seiser
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Geun Lee
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Jaurette Dozier
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Jeremy Feldman
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Lance Robinson
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Bradley Zayac
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
Alden Grobicki
Affiliation:
[email protected], Blue Wave Semiconductors, Inc., 21227, Maryland, United States
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Abstract

A compact and efficient hot filament chemical vapor deposition system has been designed for growing electronic-grade diamond and related materials. We report here the effect of substrate rotation on quality and uniformity of HFCVD diamond films on 2” wafers, using two to three filaments with power ranging from 500 to 600 Watt. Diamond films have been characterized using x-ray diffraction, Raman Spectroscopy, scanning electron microscopy and atomic force microscopy. Our results indicate that substrate rotation not only yields uniform films across the wafer, but crystallites grow larger than without sample rotation. Well-faceted microcrystals are observed for wafers rotated at 10 rpm. We also find that the Raman spectrum taken from various locations indicate no compositional variation in the diamond film and no significant Raman shift associated with intrinsic stresses. Results are discussed in the context of growth uniformity of diamond film to improve deposition efficiency for wafer-based electronic applications.

Keywords

chemical vapor deposition (CVD) (deposition)diamondthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1203: Symposium J – Diamond Electronics and Bioelectronics-Fundamentals to Applications III , 2009 , 1203-J17-25
Copyright
Copyright © Materials Research Society 2010

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References

1 Yang, Jie, Huang, Weixiao, Chow, T.P., and Butler, James E., Mater. Res. Soc. Symp. Proc. Vol. 905E, (2006).Google Scholar
2 Davidson, J. L., Kang, W. P., Holmes, K., Wisitsora-at, A., Taylor, P., Pulugurta, V., Venkatasubramanian, R., and Wells, F., “CVD Diamond for Components and Emitters,” Diamond and related Materials, 10, pp. 1736–1742, 2001.Google Scholar
3“Diamond Chemical Vapor Deposition” by Liu, H. and Dandy, D.S. (1995).Google Scholar
4 , Chen, Qijin, , Yang, Jie, and Lin, Zhangda, Appl. Phys. Lett. 67(13) (1995) 1853–1855.Google Scholar
5 Zhu, W., Sivazlian, F. R., Stoner, B. R., and Glass, J. T., J. Mater. ResNucl 10 .2 (1995) 425–430.Google Scholar
6 Zhou, X. T., Lai, H. L., Peng, H. Y., Sun, C., Zhang, W. J., Wang, N., Bello, I., Lee, C. S., and Lee, S. T., Diamond and Related Materials 9 (2000) 134–139.Google Scholar
7 Gupta, S., Weiner, B. R., Nelson, W. H., and Morell, G., Journal of Raman Spectroscopy 34 (2003) 192–198.Google Scholar
8 , Liu, Wei, , and Gu, Changzhi, Thin Solid Films 467 (2004) 4–9.Google Scholar
9 Wang, Q., Gu, C. Z., Xu, Z., Li, J. J., Wang, Z. L., Bai, X. D., and Cui, Z., J. Appl. Phys. 100 (2006) 1–5.Google Scholar
10 Kromka, A., Balon, F., Danis, T., Pavlov, J., Janik, J., Dubravcova, V., and Cerven, I., Surface Engineering 19.6 (2003) 417–420.Google Scholar
11 Janischowsky, K., Ebert, W., and Kohn, E., Surface Engineering 12 (2003) 336–339.Google Scholar
12 Larijani, M. M., Navinrooz, A., and Normand, F. Le, Thin Solid Films 501 (2006) 206–210.Google Scholar
13 , Feng, Xu, , Dunwen, Zuo, Wenzhuang, Lu, and Min, Wang, Transactions of Nanjing University of Aeronautics & Astronautics 24.4 (2007) 317–322.Google Scholar
14 Yap, H.Y., Ramaker, B., Sumant, A.V., Carpick, R.W., Diamond & Related Materials 15, 1622–1628 (2006).Google Scholar