Article contents
Combined Spectroscopic Ellipsometry and Ion Beam Surface Analysis for In-Situ Real-Time Characterization of Complex Oxide Film Growth
Published online by Cambridge University Press: 10 February 2011
Abstract
In-situ real time characterization of chemically and structurally complex thin films is becoming important as complex materials are finding more applications in electronic devices. To this end, a unique thin film growth and deposition system was constructed combining a multi-target sputter deposition system with spectroscopic ellipsometry and time-of-flight ion scattering and recoil spectroscopy. This system is demonstrated with studies on YBa2Cu3O7−δand BaSrTiO3 films.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1999
References
REFERENCES
- 4
- Cited by