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Published online by Cambridge University Press: 26 February 2011
The combinatorial fabrication of nanocrystalline Si particles embedded in a SiO2 matrix (nc-Si:SiO2) by RF co-sputtering of Si and SiO2 targets is described. The peak of the photoluminescence (PL) spectra of the films varies systematically from 760 to 600 nm, consistent with the presumed systematic variation in the size distribution of the embedded Si particles. The correlation between the optical properties of the samples and the formation parameters is also analyzed.