Hostname: page-component-586b7cd67f-dsjbd Total loading time: 0 Render date: 2024-11-25T18:29:12.017Z Has data issue: false hasContentIssue false
  • English
  • Français

Colossal Magnetoresistance in Thick La0.7Ca0.3MnO3 Films

Published online by Cambridge University Press:  15 February 2011

Randolph E. Treece ,
P. Dorsey ,
M. Rubinstein ,
J. M. Byers ,
J. S. Horwitz ,
E. Donovan  and
D. B. Chrisey
Randolph E. Treece
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
P. Dorsey
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
M. Rubinstein
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
J. M. Byers
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
J. S. Horwitz
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
E. Donovan
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
D. B. Chrisey
Affiliation:
Naval Research Laboratory, Washington, DC 20375.
Get access

Abstract

Thick films (0.6 and 2.0 μm) of the colossal magnetoresistance (CMR) material, La0.7Ca0.3MnO3 (LCMO), have been grown by pulsed laser deposition (PLD). The films were grown from single-phase LCMO targets in 100 mTorr 02 pressures and the material deposited on (100) LaAlO3 substrates at deposition temperatures of 800°C. The deposited films were characterized by X-ray diffraction (XRD), magnetic field-dependent resistivity, and Rutherford backscattering spectroscopy (RBS). The LCMO films were shown by XRD to adopt an orthorhombic structure. Brief post-deposition annealing led to ~50,000% and ~12,000% MR effect in the 0.6 μm and 2.0 μm films, respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 384: Symposium L – Magnetic Ultrathin films, Multilayers and Surfaces , 1995 , 427
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Hemlot, R. von, Wecker, J., Holzapfel, B., schultz, L., and Samwer, K., Phys. Rev. Lett. 71, 2331 (1993).Google Scholar
2. Chahara, K., Ohno, T., Kasai, M., and Kozono, Y., Appl. Phys. Lett. 63, 1990 (1993).Google Scholar
3. Jin, S., Tiefel, T. H., McCormack, M., Fastnacht, R. A., Ramesh, R., and Cohen, L. H., Science 264, 413, (1994); M. McCormack, S. Jin, T. H. Tiefel, R. M. Fleming, Julia M. Phillips, and R. Ramesh, Appl. Phys. Lett. 64, 3015 (1994).Google Scholar
4. Jin, S., McCormack, M., Tiefel, T. H., Ramesh, R., J. Appl. Phys. 76, 6929 (1994).Google Scholar
5. Xiong, G. C., Li, Q., Ju, H. L., Mao, S. N., Senapati, L., Xi, X. X., Greene, R. L., and Venkatesan, T., Appl. Phys. Lett. 66, 1427 (1995).Google Scholar
6. Powder Diffraction File (Joint Committee on Powder Diffraction Standards-International Center for Diffraction Data, Swarthmore, PA, 1986) file no. 35–1353 (LaMnO3).Google Scholar
7. Yakel, H. L., Acta. Cryst. 8, 394 (1955).Google Scholar