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Colloidal Silica Films as Substrates for High Density DNA Arrays

Published online by Cambridge University Press:  01 February 2011

M. Glazer ,
C. Frank ,
J. Lussi ,
J. Fidanza  and
G. Mcgall
M. Glazer
Affiliation:
Chemical Engineering Department, Stanford University, Stanford, CA, 94305, [email protected];
C. Frank
Affiliation:
Chemical Engineering Department, Stanford University, Stanford, CA, 94305, [email protected];
J. Lussi
Affiliation:
Chemical Engineering Department, Stanford University, Stanford, CA, 94305, [email protected];
J. Fidanza
Affiliation:
Affymetrix, Santa Clara, CA, 94086
G. Mcgall
Affiliation:
Affymetrix, Santa Clara, CA, 94086
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Abstract

Two processes for depositing colloidal silica films that can be used as high surface area substrates for DNA arrays are presented. The films boost the hybridization signal above that obtainable from the same lateral area of a “flat” array. In the first process, colloidal silica is deposited directly from solution. In the second, a templating technique is introduced to give added control over the pore size and porosity of the film. Polymer latex is co -deposited with the silica and then pyrolyzed, resulting in larger pores and higher porosity. Both types of films are tested for functional performance with DNA arrays and show promising results.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 628: Symposium CC – Hybrid Organic/Inorganic Materials , 2000 , CC10.4
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

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