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Coherency Stresses in Mo/Ni Multilayer Films

Published online by Cambridge University Press:  25 February 2011

J.A. Bain ,
L.J. Chyung ,
S. Brennan  and
B.M. Clemens
J.A. Bain
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205
L.J. Chyung
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305-2205
S. Brennan
Affiliation:
Stanford Synchrotron Radiation Laboratory, Stanford, CA 94309
B.M. Clemens
Affiliation:
Stanford Synchrotron Radiation Laboratory, Stanford, CA 94309
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Abstract

Strain measurements were performed on multilayer films of Mo/Ni using x-ray diffraction with the scattering vector at varying degrees of inclination to the surface normal. In-plane variations in the lattice parameters confirm that there are coherency stresses between the Mo and Ni layers. Assuming the Nishiama-Wasserman orientation for the planes of Ni and Mo allowed the calculation of the complete stress state in both materials. The in-plane lattice parameter, the perpendicular lattice parameter and the unstrained lattice parameter have also been derived from the data. The substrate interaction stress which would be necessary to provide a force balance between the layers was calculated. This was found to be in good agreement with the global stress measured from wafer curvature. Preliminary results of modelling of the high angle superlattice lines to extract interfacial roughness in the growth direction are also presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 221: Symposium C – Heteroepitaxy of Dissimilar Materials , 1991 , 477
Copyright
Copyright © Materials Research Society 1991

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References

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