Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-17T19:18:24.975Z Has data issue: false hasContentIssue false

CMOS compatible Si/SiO2 multilayers for Light Emitting Diodes

Published online by Cambridge University Press:  17 March 2011

Z. Gaburro
Affiliation:
INFM and Department of Physics, University of Trento, via Sommarive 14, I-38050 Povo (Tn), Italy
L. Pavesi
Affiliation:
INFM and Department of Physics, University of Trento, via Sommarive 14, I-38050 Povo (Tn), Italy
G. Pucker
Affiliation:
ITC-IRST, via Sommarive 16, I-38050 Povo (Tn), Italy
P. Bellutti
Affiliation:
ITC-IRST, via Sommarive 16, I-38050 Povo (Tn), Italy
Get access

Abstract

We report photoluminescence and electroluminescence at room temperature in diodes based on Si/SiO2 multilayers. The multilayers are fabricated by alternating Si and SiO2 layers, whose thickness is, respectively, 2 and 5 nanometers. In photoluminescence, a single band is observed, centered at 800 nm, which is due to electron-hole pair recombination under quantum confinement. On the other hand, in electroluminescence, two bands are reported. The first band is in the infrared spectrum, and is blackbody radiation. The second band is visible, and is originated by relaxation of a single type of electrical carrier (electrons), as suggested by a fast decay time (less than 0.1 µs). Possible mechanisms can be hot-electron relaxation or coupling with surface plasmon-polaritons.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Iyer, S. S. and Xie, Y.-H., Science, 260, 40 (1993).Google Scholar
2. Mi, Q., Xiao, X., Sturm, J. C., Lenchyshyn, L. C., and Thewalt, M. L. W., Appl. Phys. Lett., 60,3177 (1992).Google Scholar
3. Liu, C. W., Lee, M. H., Chen, M.-J., Lin, I. C., and Lin, C.-F., Appl. Phys. Lett., 76, 1516 (2000).Google Scholar
4. Silicon Based Microphotonics: From Basics to Applications, Proceedings of the E. Fermi Schools: Course CXLI, ed. Bisi, O., Campisano, S. U., Pavesi, L., and Priolo, F. (IOS, Amsterdam, 1999).Google Scholar
5. Takahashi, Y., Furuta, T., Ono, Y., Ishiyama, T., and Tabe, M., Jpn. J. Appl. Phys. Part 1, 34, 950 (1995).Google Scholar
6. Lu, Z. H., Lockwood, D. J., and Baribeau, J. M., Nature, 378, 258 (1995).Google Scholar
7. Kanemitsu, Y. and Okamoto, S., Phys. Rev., B56, 561 (1997).Google Scholar
8. Zacharias, M., Tsybeskov, L., Hirschman, K. D., Fauchet, P. M., Bälsing, J., Kohlert, P., and Veit, P., J. Non-Cryst. Solids, 227–230, 1132 (1998).Google Scholar
9. Tsybeskov, L., Hirschman, K. D., Duttagupta, S. P., Zacharias, M., Fauchet, P. M., McCaffrey, J. P., and Lockwood, D. J., Phys. Status Solidi, A165, 69 (1998).Google Scholar
10. Keränen, J., Lepistö, T., Ryen, L., Novikov, S. V., and Olsson, E., J. Appl. Phys., 84, 6827 (1998).Google Scholar
11. Tsybeskov, L., Hirschman, K. D., Duttagupta, S. P., Zacharias, M., Fauchet, P. M., McCaffrey, J. P., and Lockwood, D. J., Appl. Phys. Lett., 72, 43 (1998).Google Scholar
12. Heikkilä, L., Kuusela, T., Hedman, H.-P., and Ihantola, H., Appl. Surf. Sci., 133, 84 (1998).Google Scholar
13. Sullivan, B. T. and Labbé, H. J., J. Lumin., 80, 75 (1999).Google Scholar
14. Baribeau, J. M., Lockwood, D. J., Lu, Z. H., Labbé, H. J., Rolfe, S. J., and Sproule, G. I., J. Lumin., 80, 417 (1999).Google Scholar
15. Khriachtchev, L., Räsänen, M., Novikov, S., Kilpelä, O., and Sinkkonen, J., J. Appl. Phys., 86, 5601 (1999).Google Scholar
16. Pucker, G., Bellutti, P., Spinella, C., Gatterer, K., Cazzanelli, M., and Pavesi, L., J. Appl. Phys., 88, 6044 (2000).Google Scholar
17. CRC Handbook of Chemistry and Physics 81th ed., by Lide, D.R. (ed.).Google Scholar
18. Kanemitsu, Y., Phys. Rev., B53, 13515 (1996).Google Scholar
19. Laks, B., and Mills, D.L., Phys Rev., B20, 4962 (1979).Google Scholar
20. Theis, T. N., Kirtley, J. R., DiMaria, D. J., and Dong, D. W., Phys. Rev. Lett., 50, 720 (1983).Google Scholar
21. , Watanabe et al. , Jpn. J. Appl. Phys., 32, 99 (1993).Google Scholar
22. , Cartier et al. , Microel. Engin., 36, 103 (1997).Google Scholar
23. , DiMaria et al. , J. Appl. Phys., 57, 1214 (1985).Google Scholar