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Cluster Beam Deposition of High Temperature Material

Published online by Cambridge University Press:  28 February 2011

William J. Herron  and
James F. Garvey
William J. Herron
Affiliation:
Acheson Hall, Dept. of Chemistry, State University of New York at Buffalo, Buffalo, NY 14214
James F. Garvey
Affiliation:
Acheson Hall, Dept. of Chemistry, State University of New York at Buffalo, Buffalo, NY 14214
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Abstract

We present our latest attempts to utilize a Smalley-type cluster beam source, to generate novel thin films. This technique employs entraining, within a high pressure molecular beam expansion, the products generated from laser ablation of a rotating target rod. We will show how such a cluster beam source can be used to generate a high temperature material within a molecular beam and deposit it intact on a relatively cool substrate. By tailoring the various expansion conditions (ie., expansion pressure, laser fluence, type of carrier gas, pulse delay, etc...) one can drastically effect the morphology and chemical nature of the surface generated. This technique has the promise that it may be able to fabricate a wide variety of thin films with obvious industrial applications (superconducting thin films, diamond-like carbon films, patterned or multi-layered thin films, etc...)

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 206: Symposium G – Clusters and Cluster-Assembled Materials , 1990 , 391
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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