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Chemistry of Electrochromic IrOx. Films Deposited Under Variable Redox Conditions

Published online by Cambridge University Press:  16 February 2011

J. D. Klein  and
S. L. Clauson
J. D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
S. L. Clauson
Affiliation:
EIC Laboratories, Norwood, MA 02062
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Abstract

A thin film deposition technique is described whereby the oxidation condition of as-deposited iridium oxide thin films can be manipulated by varying deposition conditions. Iridium oxide thin films were deposited by reactive rf magnetron sputtering in a H2/O2/Ar gas blend. Optical emission spectroscopy, an in-situ process monitor, was employed to observe redox interactions in the deposition plasma. The plasma spectra exhibited characteristics normally observed in hydrogen flame spectroscopy. A competitive redox balance was found to exist between atomic O and atomic H emissions. Plasma redox conditions defined by the H-O emissions could be accessed by a variety of gas flow conditions. Electrochemical aspects of the IrOx films were examined by cyclic voltammetry. Electrochromic capabilities were demonstrated through optical transmittance.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 369: Symposium U – Solid State Ionics IV , 1994 , 149
Copyright
Copyright © Materials Research Society 1995

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