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Chemical Vapor Deposition of Lead-Titanate

Published online by Cambridge University Press:  25 February 2011

Anton C. Greenwald ,
James T. Daly  and
Nader M. Kalkhoran
Anton C. Greenwald
Affiliation:
Spire Corporation, One Patriots Park, Bedford MA 01730-2396
James T. Daly
Affiliation:
Spire Corporation, One Patriots Park, Bedford MA 01730-2396
Nader M. Kalkhoran
Affiliation:
Spire Corporation, One Patriots Park, Bedford MA 01730-2396
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Abstract

Thin films of lead-titanate were deposited by chemical vapor deposition (CVD) using tetraethyl lead and titanium isopropoxide. Good high frequency hysteresis curves were obtained with platinum contacts. Low resistance of the material (estimated at 108 ohm-cm) affected low frequency measurements.

Optimized experimental parameters (pressure, temperature, gas flows, oxidizer) were derived from a designed experimental matrix using response surface methodology. This approach significantly reduced the number of deposition trials required.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 243: Symposium G – Ferroelectric Thin Films II , 1991 , 229
Copyright
Copyright © Materials Research Society 1992

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