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Characterization of TiN Films Prepared by ion Beam Assisted Deposition

Published online by Cambridge University Press:  28 February 2011

Albert L. Chang  and
R. A. Kant
Albert L. Chang
Affiliation:
Westinghouse Electric Corp., P. O. Box 185, Boston, MA 02258
R. A. Kant
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375
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Abstract

One of the advantages of the ion beam assisted deposition process is its controllability of the processing parameters such as: ion-to-atom arrival ratio and the ion energy. In this study, the effects of the nitrogen ion energy (from 1 KV to 30KV) on the TiN film morphology and microstructures were systematically investigated as a function of ion-to-atom arrival ratios, using TEM, XTEM, SEM, ESCA and other analytical techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 140: Symposium S – New Materials Approaches to Tribology: Theory and Applications , 1988 , 201
Copyright
Copyright © Materials Research Society 1989

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References

1. Sartwell, B. D., Ion Plating And Implantation: Application to Materials, Hochman, R. F. ed., Atlanta, GA, pp. 81–89 (1985)Google Scholar
2. Bolster, R.N., Singer, I. L., Kant, R. A., Sartwell, B. D. and Gossett, C. R., presented at International Conference on Metallurgy Coatings, April 11-15, 1988, San Diego, CAGoogle Scholar
3. Hubler, G. K., Vechten, D. Van, Donovan, E. P. and Kant, R. A., presented at ASM Conference on Ion Implantation and Plasma Assisted Processes for Industrial Applications, May 22-25, 1988, Atlanta, GAGoogle Scholar
4. Baglin, J.E.E., MRS Symposium on Thin Films: The Relationship of Structure to Properties, MRS Symposium Proceedings,47, pp. 3–10 (1985)CrossRefGoogle Scholar
5. Bravman, J. C. and Sinclair, R., J. Electron Microscopy Technique, 1, pp. 53–61 (1984)CrossRefGoogle Scholar
6. Dauplaise, H. M. and Chang, A. L., U. S. Army Materials Technology Laboratory Technical Re= (to be published)Google Scholar
7. Kant, R. A., Dillich, S. A., Sartwell, B.D. and Sprague, J. A., (presented at this MRS meeting, A 3.6/$3.6, Fall 1988)Google Scholar
8. Middleton, R. and Chang, A. L., U.S.Army Materials Technology Laboratory Technical Report. (to be published)Google Scholar